Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.34 |
| ▸ | TP53 | P04637 | 3/20 | 0.34 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4465024 | 0.84 | TSHR (0.34) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL4568747 | 0.83 | TSHR (0.37) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| Ammonia Solution, Strong SCHEMBL1020835 | 0.81 | TSHR (0.35) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL1371810 | 0.80 | — | — | |
| SCHEMBL693228 | 0.80 | — | — | |
| SCHEMBL15836525 | 0.79 | TSHR (0.34) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL21013008 | 0.79 | TSHR (0.34) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL75108 | 0.79 | TSHR (0.31) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL9610657 | 0.79 | TSHR (0.31) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| Tert-Butanol SCHEMBL28110403 | 0.78 | TSHR (0.37) | TSHRALDH1A1TP53HIF1ACYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | claimed |
| US-20060247400-A1 | Photoresist compositions and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-11-02 | — | — | US | claimed |
| EP-1411389-A1 | Photoresists with hydroxylated, photoacid-cleavable groups | E.I. du Pont de Nemours and Company (US) | 2004-04-21 | — | — | EP | claimed |
| EP-2970538-B1 | POLYMERIZATION PROCESS PROTECTION MEANS | DUPONT ELECTRONICS INC (US) | 2021-10-20 | — | — | EP | disclosed |
| EP-3061795-B1 | ACTIVE-ENERGY-RAY-CURABLE COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INK, COMPOSITION STORED CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, METHOD FOR FORMING TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE, CURED MATERIAL, DECORATIVE BODY, AND ACTIVE ENERGY RAY POLYMERIZABLE COMPOUND | RICOH CO LTD (JP) | 2019-04-24 | — | — | EP | disclosed |
| EP-3061795-A1 | ACTIVE-ENERGY-RAY-CURABLE COMPOSITION | Ricoh Company, Ltd. (JP) | 2016-08-31 | — | — | EP | disclosed |
| EP-2970538-A1 | POLYMERIZATION PROCESS PROTECTION MEANS | E. I. du Pont de Nemours and Company (US) | 2016-01-20 | — | — | EP | disclosed |
| US-20150346600-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-03 | — | — | US | disclosed |
| EP-2315739-B1 | NEW PROPANOATES AND PROCESSES FOR PREPARING THE SAME | DUPONT ELECTRONIC POLYMERS L P (US) | 2014-11-12 | — | — | EP | disclosed |
| WO-2014150700-A1 | POLYMERIZATION PROCESS PROTECTION MEANS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2014-09-25 | — | — | WO | disclosed |
| EP-1699850-B1 | POLYMER PURIFICATION | DUPONT ELECTRONIC POLYMERS L P (US) | 2014-06-25 | — | — | EP | disclosed |
| US-20050187377-A1 | Polymer purification | DUPONT ELECTRONIC POLYMERS L. P. | 2005-08-25 | — | — | US | disclosed |
| US-20040248039-A1 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY | 2004-12-09 | — | — | US | disclosed |
| US-20040242798-A1 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY | 2004-12-02 | — | — | US | disclosed |
| EP-1479700-A1 | Processes for preparing photoresist compositions | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2004-11-24 | — | — | EP | disclosed |
| US-6787611-B2 | COPOLYOMERS ARE A MIXTURE OF COMPOUNDS OF VARYING COMPOSITION AND MOLECULAR WEIGHT. TYPICALLY THEY CONTAIN SMALL QUANTITIES OF STARTING MATERIAL AND BY-PRODUCTS WHICH ARE UNDESIRABLE IN THE FINAL POLYMER. THE POLYMER MIXTURE IS PRECIPITATED FROM | CHEMFIRST ELECTRONIC MATERIALS L.P. | 2004-09-07 | — | — | US | disclosed |
| US-20030144470-A1 | Purification means | CHEMFIRST ELECTRONIC MATERIALS LP | 2003-07-31 | — | — | US | disclosed |
| EP-0408085-B1 | Hydrophobic and/or abhesive mass, reactive diluent, plasticizer and their use | HINTERWALDNER RUDOLF (DE) | 1995-05-17 | — | — | EP | disclosed |
| EP-0153375-B1 | HYDROPHOBIC AND/OR ANTIADHESIVE MASSES, REACTIVE DILUENTS, PLASTICIZER AND UTILIZATION THEREOF | Hinterwaldner, Rudolf (DE) | 1991-03-13 | — | — | EP | disclosed |
| EP-0408085-A2 | Hydrophobic and/or abhesive mass, reactive diluent, plasticizer and their use | Hinterwaldner, Rudolf (DE) | 1991-01-16 | — | — | EP | disclosed |