SCHEMBL160316

SCHEMBL160316

COCOC(C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18354055 0.83
SCHEMBL2865662 0.82
SCHEMBL16796585 0.77
SCHEMBL431563 0.76 HSD17B10 (0.30)
Dimethoxymethane SCHEMBL15756461 0.76
SCHEMBL2740454 0.73
SCHEMBL17998029 0.73 LMNA (0.44)
SCHEMBL242589 0.73
SCHEMBL8991000 0.73
SCHEMBL27288782 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1284 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106543375-B High-molecular antistatic agent and preparation method and application thereof 乐凯华光印刷科技有限公司 2021-11-16 CN claimed
US-20050209355-A1 [Novel Reactions and the Products of Such Reactions] ROITMAN LIPA L 2005-09-22 US claimed
US-6695903-B1 SCREEN-PRINTABLE MASKING PASTE COMPRISING: ONE OR MORE SILANES, SOLVENTS, AN ACID AND WATER, AND ONE OR MORE ADDITIVES MERCK PATENT GMBH (DE) 2004-02-24 US claimed
US-4929533-A Using light sensitive diazo resin and high molecular weight copolymer FUJI PHOTO FILM CO., LTD. (JP) 1990-05-29 US claimed
CN-122094838-A On-press development type lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 2026-05-26 CN disclosed
EP-3950753-B1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, INDUCTOR AND ANTENNA FUJIFILM CORP (JP) 2026-03-25 EP disclosed
EP-4692947-A1 CHEMICAL SOLUTION AND PATTERNING METHOD FUJIFILM Corporation (JP) 2026-02-11 EP disclosed
US-20250390021-A1 CHEMICAL LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2025-12-25 US disclosed
US-12474630-B2 Pellicle demounting method and pellicle demounting preprocessing device MITSUI CHEMICALS, INC. (JP) 2025-11-18 US disclosed
US-12452994-B2 Structure, method for manufacturing structure, and composition FUJIFILM CORPORATION (JP) 2025-10-21 US disclosed
US-12422746-B2 Photosensitive composition, cured film, color filter, light shielding film, optical element, solid-state imaging element, infrared sensor, and headlight unit FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
US-20250215324-A1 COMPOSITION, LIQUID CRYSTAL FILM, FILM, DISPLAY DEVICE, AND DISPERSANT FUJIFILM CORPORATION (JP) 2025-07-03 US disclosed
US-4810618-A HIGH SENSITIVITY, PRINTING PLATES, PHOTORESISTS FUJI PHOTO FILM CO., LTD. (JP) 1989-03-07 US disclosed
US-4803145-A COLORING FILM OF UNIFORM THICKNESS FUJI PHOTO FILM CO., LTD. (JP) 1989-02-07 US disclosed
EP-0275892-A2 Process for the oxydehydrogenation of monoethers of polyglycols into the corresponding aldehydes HOECHST AKTIENGESELLSCHAFT (DE) 1988-07-27 EP disclosed
EP-0239082-A2 Light-sensitive composition Fuji Photo Film Co., Ltd. (JP) 1987-09-30 EP disclosed
EP-0230995-A2 Light-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1987-08-05 EP disclosed
US-4210412-A POLYALKYLENE GLYCOL SWELLING AGENT AND SUBLIMABLE DISPERSE DYE TOYO BOSEKI KABUSHIKI KAISHA (JP) 1980-07-01 US disclosed
US-4207069-A PRETREATMENT WITH A SWELLING AGENT FOR CELLULOSE FIBERS AND PRINTING WITH OIL-SOLUBLE OR DISPERSE DYE TOPPAN PRINTING CO., LTD. (JP) 1980-06-10 US disclosed
US-3948960-A ADDITION, HYDROGEN PEROXIDE, INTRAPHASE PONY INDUSTRIES, INC., A CORP. OF DE 1976-04-06 US disclosed