Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARA | Q07869 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | FAAH | O00519 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | TRPV1 | Q8NER1 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.41 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | XBP1 | P17861 | 1/20 | 0.41 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10717013 | 0.90 | FAAH (0.54) | PPARATSHRFAAHTRPV1LMNA | |
| SCHEMBL11386547 | 0.90 | FAAH (0.54) | PPARATSHRFAAHTRPV1LMNA | |
| SCHEMBL4915596 | 0.90 | FAAH (0.54) | PPARATSHRFAAHTRPV1LMNA | |
| SCHEMBL8989608 | 0.83 | ALDH1A1 (0.38) | TSHRFAAHALDH1A1NPC1S1PR2 | |
| SCHEMBL1110005 | 0.82 | PPARA (0.42) | PPARATSHRFAAHALDH1A1TRPV1 | |
| SCHEMBL4902322 | 0.82 | PPARA (0.42) | PPARATSHRFAAHALDH1A1TRPV1 | |
| SCHEMBL1110003 | 0.82 | PPARA (0.42) | PPARATSHRFAAHALDH1A1TRPV1 | |
| SCHEMBL11859541 | 0.80 | PPARA (0.41) | PPARATSHRFAAHALDH1A1TRPV1 | |
| SCHEMBL1794508 | 0.80 | PPARA (0.41) | PPARATSHRFAAHALDH1A1TRPV1 | |
| SCHEMBL2863985 | 0.80 | PPARA (0.46) | PPARATSHRFAAHALDH1A1TRPV1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0530204-B1 | DISPERSANT COMPOSITIONS FOR SUBTERRANEAN WELL DRILLING AND COMPLETION | ATLANTIC RICHFIELD CO (US) | 1996-07-17 | — | — | EP | claimed |
| US-8647814-B2 | Method of making nanopatterns and nanostructures and nanopatterned functional oxide materials | NORTHWESTERN UNIVERSITY (US) | 2014-02-11 | — | — | US | disclosed |
| US-8426208-B2 | Method and apparatus for determining radiation | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2013-04-23 | — | — | US | disclosed |
| US-20120295360-A1 | METHOD AND APPARATUS FOR DETERMINING RADIATION | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2012-11-22 | — | — | US | disclosed |
| US-8187887-B2 | Method and apparatus for determining radiation | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2012-05-29 | — | — | US | disclosed |
| WO-2011044221-A2 | METHOD AND APPARATUS FOR DETERMINING RADIATION | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2011-04-14 | — | — | WO | disclosed |
| US-20110081724-A1 | METHOD AND APPARATUS FOR DETERMINING RADIATION | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2011-04-07 | — | — | US | disclosed |
| US-20080070010-A1 | Method of making nanopatterns and nanostructures and nanopatterned functional oxide materials | NORTHWESTERN UNIVERSITY | 2008-03-20 | — | — | US | disclosed |
| CN-1193405-C | Optical mask, its producing method, image forming method and method for producing semicondcutor device | HITACHI LTD (JP) | 2005-03-16 | — | — | CN | disclosed |
| CN-1365135-A | Optical mask, its producing method, image forming method and method for producing semicondcutor device | HITACHI LTD (JP) | 2002-08-21 | — | — | CN | disclosed |
| US-20020081501-A1 | Device manufacturing method, photomask used for the method, and photomask manufacturing method | HITACHI, LTD. | 2002-06-27 | — | — | US | disclosed |
| EP-0984327-A2 | Process for producing halftone mask | SHARP KABUSHIKI KAISHA (JP) | 2000-03-08 | — | — | EP | disclosed |
| US-5512328-A | Method for forming a pattern and forming a thin film used in pattern formation | HITACHI, LTD. (JP) | 1996-04-30 | — | — | US | disclosed |
| US-4764330-A | POLYSILOXANE INTERNAL MOLD RELEASE AGENTS | THE DOW CHEMICAL COMPANY (US) | 1988-08-16 | — | — | US | disclosed |
| US-4570010-A | AMINO-TERMINATED POLYDIMETHYL SILOXANE AS RELEASE AGENT FOR POLYURETHANE MOLDS | THE UPJOHN COMPANY (US) | 1986-02-11 | — | — | US | disclosed |
| US-4284775-A | 1,4-Diazabicyclooctane di-N,N'-quaternized compounds | THE UPJOHN COMPANY (US) | 1981-08-18 | — | — | US | disclosed |
| US-4216322-A | Process for making triethylene diamines | THE UPJOHN COMPANY (US) | 1980-08-05 | — | — | US | disclosed |