Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8048977 | 0.82 | TSHR (0.50) | TSHRALDH1A1 | |
| SCHEMBL11695445 | 0.82 | TSHR (0.32) | TSHRALDH1A1 | |
| SCHEMBL11697726 | 0.80 | THRB (0.32) | TSHRALDH1A1 | |
| SCHEMBL16074888 | 0.79 | — | — | |
| SCHEMBL19518719 | 0.79 | — | — | |
| SCHEMBL13181400 | 0.79 | — | — | |
| SCHEMBL28096542 | 0.78 | TSHR (0.46) | TSHR | |
| SCHEMBL16078669 | 0.78 | ALDH1A1 (0.40) | TSHRALDH1A1 | |
| SCHEMBL8576781 | 0.77 | TSHR (0.50) | TSHR | |
| SCHEMBL25078804 | 0.76 | TSHR (0.44) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9188866-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |