Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 2/20 | 0.38 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | FDPS | P14324 | 8/20 | 0.30 |
| ▸ | GGPS1 | O95749 | 5/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16074828 | 1.00 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAALDH1A1HSD17B10 | |
| SCHEMBL16074791 | 1.00 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAALDH1A1HSD17B10 | |
| SCHEMBL16074820 | 1.00 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAALDH1A1HSD17B10 | |
| SCHEMBL16074837 | 1.00 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAALDH1A1HSD17B10 | |
| SCHEMBL16074812 | 1.00 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAALDH1A1HSD17B10 | |
| SCHEMBL16074798 | 1.00 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAALDH1A1HSD17B10 | |
| SCHEMBL16074857 | 1.00 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAALDH1A1HSD17B10 | |
| SCHEMBL16074894 | 1.00 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAALDH1A1HSD17B10 | |
| SCHEMBL16074827 | 1.00 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAALDH1A1HSD17B10 | |
| SCHEMBL16074701 | 0.98 | ALDH1A1 (0.36) | CYP4F2CYP4A11LMNAALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9188866-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |