Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | FDPS | P14324 | 9/20 | 0.43 |
| ▸ | GGPS1 | O95749 | 7/20 | 0.43 |
| ▸ | SMPD1 | P17405 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | CES2 | O00748 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16074817 | 1.00 | ALDH1A1 (0.48) | ALDH1A1FDPSGGPS1SMPD1TSHR | |
| SCHEMBL16074882 | 1.00 | ALDH1A1 (0.48) | ALDH1A1FDPSGGPS1SMPD1TSHR | |
| SCHEMBL16074947 | 1.00 | ALDH1A1 (0.48) | ALDH1A1FDPSGGPS1SMPD1TSHR | |
| SCHEMBL16074823 | 1.00 | ALDH1A1 (0.48) | ALDH1A1FDPSGGPS1SMPD1TSHR | |
| SCHEMBL16074861 | 1.00 | ALDH1A1 (0.48) | ALDH1A1FDPSGGPS1SMPD1TSHR | |
| SCHEMBL16074760 | 1.00 | ALDH1A1 (0.48) | ALDH1A1FDPSGGPS1SMPD1TSHR | |
| SCHEMBL16077462 | 1.00 | ALDH1A1 (0.48) | ALDH1A1FDPSGGPS1SMPD1TSHR | |
| SCHEMBL16074725 | 0.98 | ALDH1A1 (0.50) | ALDH1A1FDPSGGPS1SMPD1CES2 | |
| SCHEMBL1024661 | 0.93 | FDPS (0.45) | ALDH1A1FDPSGGPS1SMPD1TSHR | |
| SCHEMBL11393476 | 0.93 | FDPS (0.48) | FDPSGGPS1SMPD1TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9188866-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |