Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9456576 | 0.88 | — | — | |
| SCHEMBL31229762 | 0.87 | CA1 (0.48) | CA1CA2TSHRCA9 | |
| SCHEMBL7920518 | 0.87 | CA1 (0.40) | CA1CA2 | |
| SCHEMBL3342897 | 0.81 | CA1 (0.64) | CA1CA2ALDH1A1KDM4EUSP2 | |
| SCHEMBL7575729 | 0.78 | — | — | |
| SCHEMBL11155659 | 0.75 | — | — | |
| SCHEMBL2734239 | 0.75 | — | — | |
| SCHEMBL10629834 | 0.75 | — | — | |
| SCHEMBL11883897 | 0.75 | — | — | |
| SCHEMBL8666163 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8557144-B2 | Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head | FUJITSU LIMITED (JP) | 2013-10-15 | — | — | US | claimed |
| US-5547806-A | ADDING A DIALKYL SULFATE AND A POLYFUNCTIONAL ISOCYANATE COMPOUND; EMULSIFICATION; POLYMERIZATION; MICROENCAPSULATION | FUJI PHOTO FILM CO., LTD. (JP) | 1996-08-20 | — | — | US | claimed |
| JP-3005462-A | — | — | None | — | — | JP | disclosed |
| EP-2138897-B1 | CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF RESIST PATTERN | FUJITSU LTD (JP) | 2016-08-03 | — | — | EP | disclosed |
| US-8795951-B2 | Material for forming resist sensitization film and production method of semiconductor device | FUJITSU LIMITED (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8557144-B2 | Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head | FUJITSU LIMITED (JP) | 2013-10-15 | — | — | US | disclosed |
| US-20110081615-A1 | MATERIAL FOR FORMING RESIST SENSITIZATION FILM AND PRODUCTION METHOD OF SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-04-07 | — | — | US | disclosed |
| US-20100009296-A1 | MATERIAL FOR FORMING CONDUCTIVE ANTIREFLECTION FILM, METHOD FOR FORMING CONDUCTIVE ANTIREFLECTION FILM, METHOD FOR FORMING RESIST PATTERN, SEMICONDUCTOR DEVICE, AND MAGNETIC HEAD | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2138897-A1 | MATERIAL FOR FORMATION OF CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF RESIST PATTERN, SEMICONDUCTOR DEVICE, AND MAGNETIC HEAD | Fujitsu Limited (JP) | 2009-12-30 | — | — | EP | disclosed |
| US-5547806-A | ADDING A DIALKYL SULFATE AND A POLYFUNCTIONAL ISOCYANATE COMPOUND; EMULSIFICATION; POLYMERIZATION; MICROENCAPSULATION | FUJI PHOTO FILM CO., LTD. (JP) | 1996-08-20 | — | — | US | disclosed |
| EP-0259849-B1 | PROCESS FOR THE PREPARATION OF C.I. VAT BLUE 16 | BASF Aktiengesellschaft (DE) | 1991-10-16 | — | — | EP | disclosed |
| JP-H035462-A | PREPARATION OF 1-(2-CHLOROETHYL)-2-METHYL-5-NITROIMIDAZOLE | RHONE POULENC SANTE | 1991-01-11 | — | — | JP | disclosed |
| EP-0399900-A1 | Process for the preparation of 1-(2-chloro-ethyl)-2-methyl-5-nitro imidazol | RHONE-POULENC SANTE (FR) | 1990-11-28 | — | — | EP | disclosed |
| US-4824608-A | ALKYLATING 16,17-DIHYDROXYVIOLANTHRENE-5,10-DIONE IN TERTIARY ALIPHATIC OR CYCLOALIPHATIC AMINE AS SOLVENT | BASF AKTIENGESELLSCHAFT (DE) | 1989-04-25 | — | — | US | disclosed |
| EP-0259849-A2 | Process for the preparation of C.I. vat blue 16 | BASF Aktiengesellschaft (DE) | 1988-03-16 | — | — | EP | disclosed |
| US-4421516-A | Process for preparing discharge resist prints on hydrophobic textile materials | CASSELLA AKTIENGESELLSCHAFT (DE) | 1983-12-20 | — | — | US | disclosed |