Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.52 |
| ▸ | CA12 | O43570 | 1/20 | 0.48 |
| ▸ | CA9 | Q16790 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.45 |
| ▸ | TSHR | P16473 | 3/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.45 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.45 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.45 |
| ▸ | THRB | P10828 | 1/20 | 0.45 |
| ▸ | RECQL | P46063 | 1/20 | 0.45 |
| ▸ | ATM | Q13315 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.45 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | GMNN | O75496 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9100225 | 0.82 | CA1 (0.53) | TDP1CA12CA9ALDH1A1CYP3A4 | |
| SCHEMBL30833748 | 0.81 | TDP1 (0.54) | TDP1CA12CA9ALDH1A1HSD17B10 | |
| SCHEMBL21518442 | 0.80 | TDP1 (0.48) | TDP1CA12CA9ALDH1A1HSD17B10 | |
| SCHEMBL1608192 | 0.80 | TDP1 (0.48) | TDP1CA12CA9ALDH1A1HSD17B10 | |
| SCHEMBL10794994 | 0.80 | HPGD (0.50) | TDP1CA12CA9ALDH1A1LMNA | |
| Sulfuric Acid SCHEMBL10588282 | 0.79 | ALDH1A1 (0.55) | TDP1CA12CA9ALDH1A1HSD17B10 | |
| SCHEMBL6698062 | 0.79 | TDP1 (0.52) | TDP1CA12CA9ALDH1A1HSD17B10 | |
| SCHEMBL9216477 | 0.78 | CA12 (0.47) | TDP1CA12CA9ALDH1A1HSD17B10 | |
| SCHEMBL11441698 | 0.78 | ALDH1A1 (0.49) | TDP1CA12CA9ALDH1A1HSD17B10 | |
| SCHEMBL14535198 | 0.78 | TDP1 (0.61) | TDP1CA12CA9ALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8313892-B2 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | FUJITSU LIMITED (JP) | 2012-11-20 | — | — | US | claimed |
| CN-105828882-B | Packaging article comprising an envelope and an anhydrous dye composition comprising a direct dye, use thereof and process for dyeing keratin fibres | 莱雅公司 | 2022-09-30 | — | — | CN | disclosed |
| CN-112888485-A | Cosmetic compositions, methods and uses thereof | 莱雅公司 | 2021-06-01 | — | — | CN | disclosed |
| CN-111032007-A | Method for dyeing keratin fibres using at least one direct dye and at least one fluorescent dye chosen from disulfides, thiols and protected thiols | 莱雅公司 | 2020-04-17 | — | — | CN | disclosed |
| CN-110753684-A | Method for producing nilapali | 特沙诺有限公司 | 2020-02-04 | — | — | CN | disclosed |
| EP-2138897-B1 | CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF RESIST PATTERN | FUJITSU LTD (JP) | 2016-08-03 | — | — | EP | disclosed |
| US-8795951-B2 | Material for forming resist sensitization film and production method of semiconductor device | FUJITSU LIMITED (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8557144-B2 | Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head | FUJITSU LIMITED (JP) | 2013-10-15 | — | — | US | disclosed |
| US-8313892-B2 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | FUJITSU LIMITED (JP) | 2012-11-20 | — | — | US | disclosed |
| WO-2012135286-A2 | STABILIZED ACID AMPLIFIERS | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2012-10-04 | — | — | WO | disclosed |
| EP-0271883-B1 | COLOURED WATER SOLUBLE COMPOUNDS, PROCESS FOR THEIR PREPARATION AND THEIR USE AS DYESTUFFS | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-06 | — | — | EP | disclosed |
| US-4873320-A | COLORFASTNESS; FOR COTTON AND CELLULOSE FIBER MATERIALS | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-10-10 | — | — | US | disclosed |
| EP-0212264-B1 | COLOURED WATER SOLUBLE COMPOUNDS, PROCESS FOR THEIR PREPARATION AND THEIR USE AS DYESTUFFS | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-05-31 | — | — | EP | disclosed |
| EP-0271883-A2 | Coloured water soluble compounds, process for their preparation and their use as dyestuffs | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-06-22 | — | — | EP | disclosed |
| US-4675359-A | REACTING A CARBOXYL-CONTAINING POLYMER OR COMPOUND AND AN AMI NE HAVING A HYDROPHILIC POLAR GROUP | NIPPON ZEON CO. LTD. (JP) | 1987-06-23 | — | — | US | disclosed |
| US-4652634-A | Water-soluble monoazo compounds containing a N-(sulfoalkyl)-aniline coupling component and a fiber-reactive group of the vinylsulfonyl series in the phenyl or benzothiazole diazo component, suitable as fiber-reactive dyestuffs | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-03-24 | — | — | US | disclosed |
| EP-0212264-A1 | Coloured water soluble compounds, process for their preparation and their use as dyestuffs | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-03-04 | — | — | EP | disclosed |
| US-4578457-A | Reactive mono-azo dyes and the preparation and use thereof | CIBA-GEIGY AG (CH) | 1986-03-25 | — | — | US | disclosed |
| US-4430259-A | Water-soluble disazo compounds suitable as fiber-reactive dyestuffs | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-02-07 | — | — | US | disclosed |
| EP-0051808-A2 | Water-soluble monoazo compounds, process for their preparation and their use as dyestuffs | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-05-19 | — | — | EP | disclosed |