SCHEMBL16093548

SCHEMBL16093548

CSC(=S)SC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3080474 0.83 NOS3 (0.40)
SCHEMBL256003 0.71
SCHEMBL822722 0.71 ALDH1A1 (0.36)
SCHEMBL20099218 0.71
SCHEMBL22024108 0.71 NOS3 (0.32)
SCHEMBL13475907 0.71 NOS3 (0.32)
SCHEMBL14102731 0.69
SCHEMBL21665757 0.67 HDAC3 (0.30)
SCHEMBL10200205 0.67
SCHEMBL6965028 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230050436-A1 CHLOROPRENE-BASED BLOCK COPOLYMER LATEX DENKA COMPANY LIMITED (JP) 2023-02-16 US disclosed
US-11365276-B2 Block copolymer and method for producing block copolymer DENKA COMPANY LIMITED (JP) 2022-06-21 US disclosed
US-11254807-B2 Chloroprene polymer and production method therefor DENKA COMPANY LIMITED (JP) 2022-02-22 US disclosed
WO-2021133770-A1 NANOPARTICLE WITH SINGLE SITE FOR TEMPLATE POLYNUCLEOTIDE ATTACHMENT ILLUMINA, INC. (US) 2021-07-01 WO disclosed
EP-3656795-B1 PRODUCTION METHOD OF CHLOROPRENE POLYMER DENKA COMPANY LTD (JP) 2021-03-31 EP disclosed
EP-3783040-A1 COPOLYMER OF CHLOROPRENE MONOMER AND UNSATURATED NITRILE COMPOUND, COMPOSITION CONTAINING COPOLYMER, VULCANIZATION MOLDED BODY OF COMPOSITION, AND USE OF VULCANIZATION MOLDED BODY Denka Company Limited (JP) 2021-02-24 EP disclosed
US-10858455-B2 Process for the production of water and solvent-free nitrile rubbers ARLANXEO DEUTSCHLAND GMBH (DE) 2020-12-08 US disclosed
US-20200207900-A1 BLOCK COPOLYMER AND PRODUCTION METHOD FOR BLOCK COPOLYMER DENKA COMPANY LIMITED (JP) 2020-07-02 US disclosed
US-20200165421-A1 CHLOROPRENE POLYMER AND PRODUCTION METHOD THEREFOR DENKA COMPANY LIMITED (JP) 2020-05-28 US disclosed
EP-3656795-A1 CHLOROPRENE POLYMER AND PRODUCTION METHOD THEREFOR Denka Company Limited (JP) 2020-05-27 EP disclosed
US-9671687-B2 Coloring composition, cured film, color filter, method for manufacturing color filter, solid-state imaging device, and image display device FUJIFILM CORPORATION (JP) 2017-06-06 US disclosed
US-9671687-B2 Coloring composition, cured film, color filter, method for manufacturing color filter, solid-state imaging device, and image display device FUJIFILM CORPORATION (JP) 2017-06-06 US disclosed
US-20160327858-A1 COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2016-11-10 US disclosed
US-20160327858-A1 COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2016-11-10 US disclosed
US-20160327859-A1 COLORING COMPOSITION, AND CURED FILM, COLOR FILTER, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, AND DYE MULTIMER, EACH USING THE COLORING COMPOSITION FUJIFILM CORPORATION (JP) 2016-11-10 US disclosed
US-20160327859-A1 COLORING COMPOSITION, AND CURED FILM, COLOR FILTER, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, AND DYE MULTIMER, EACH USING THE COLORING COMPOSITION FUJIFILM CORPORATION (JP) 2016-11-10 US disclosed
US-8840339-B2 Soil remediation process THE UNIVERSITY OF QUEENSLAND (AU) 2014-09-23 US disclosed