SCHEMBL1610116

SCHEMBL1610116

[CH2]CCCc1cc(C)ccc1C

nearest known ligand 0.59

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 1/20 0.59
POLB P06746 2/20 0.38
ALDH1A1 P00352 2/20 0.37
TDP1 Q9NUW8 1/20 0.37
HTT P42858 2/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
GAA P10253 1/20 0.35
KDM4E B2RXH2 1/20 0.35
HPGD P15428 1/20 0.35
KMT2A Q03164 3/20 0.33
MEN1 O00255 2/20 0.33
AMY1A P0DUB6 1/20 0.33
MAPT P10636 1/20 0.33
TP53 P04637 1/20 0.33
TACR1 P25103 1/20 0.33
NR3C1 P04150 1/20 0.33
NR3C2 P08235 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1612323 0.94 TAAR1 (0.57) TAAR1POLBALDH1A1TDP1HTT
SCHEMBL1610683 0.92 TAAR1 (0.55) TAAR1POLBALDH1A1TDP1HTT
SCHEMBL1610404 0.92 TAAR1 (0.55) TAAR1POLBALDH1A1TDP1HTT
SCHEMBL1611851 0.92 TAAR1 (0.55) TAAR1POLBALDH1A1TDP1HTT
SCHEMBL315721 0.87 TAAR1 (0.63) TAAR1POLBALDH1A1TDP1HTT
SCHEMBL1609492 0.83 PYCR1 (0.40) TAAR1ALDH1A1TDP1HTTNPC1
SCHEMBL9491792 0.82 TAAR1 (0.74) TAAR1POLBALDH1A1TDP1HTT
SCHEMBL630179 0.81 TAAR1 (0.61) TAAR1POLBALDH1A1TDP1HTT
SCHEMBL38650825 0.79 TAAR1 (0.59) TAAR1POLBALDH1A1TDP1HTT
SCHEMBL6562301 0.79 TAAR1 (0.59) TAAR1POLBALDH1A1TDP1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113166415-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method 三菱瓦斯化学株式会社 2021-07-23 CN disclosed
CN-113039177-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method 三菱瓦斯化学株式会社 2021-06-25 CN disclosed
CN-112996839-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method 三菱瓦斯化学株式会社 2021-06-18 CN disclosed
CN-111373326-A Composition for forming film for lithography, method for forming resist pattern, and method for forming circuit pattern 三菱瓦斯化学株式会社 2020-07-03 CN disclosed
US-20110087034-A1 Organic Semiconductor Material SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2011-04-14 US disclosed
EP-2248818-A1 ORGANIC SEMICONDUCTOR MATERIAL Sumitomo Chemical Company, Limited (JP) 2010-11-10 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110087034-A1 Organic Semiconductor Material OR10J3, TST, OR51E2 TAAR1 772/4885POLB 2185/4885ALDH1A1 137/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.