SCHEMBL1613142

SCHEMBL1613142

c1ccc(C2=NC(c3ccccc3)(n3c(-c4ccccc4)nc(-c4ccccc4)c3-c3ccccc3)N=C2c2ccccc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
BCHE P06276 1/20 0.35
ACHE P22303 1/20 0.35
AKT1 P31749 9/20 0.33
AKT2 P31751 9/20 0.33
MEN1 O00255 1/20 0.33
USP2 O75604 1/20 0.33
HPGD P15428 1/20 0.33
MAPK1 P28482 1/20 0.33
KMT2A Q03164 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
MAPT P10636 1/20 0.33
CASP1 P29466 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16503665 0.99 AKT1 (0.35) BCHEACHEAKT1AKT2TDP1
SCHEMBL16503705 0.97 BCHE (0.34) BCHEACHEAKT1AKT2MEN1
SCHEMBL31734214 0.90 KDM4E (0.43) AKT1AKT2MEN1KMT2AL3MBTL1
SCHEMBL16746556 0.87 MGAM (0.42) AKT1AKT2MEN1KMT2A
SCHEMBL14524165 0.86 AKT1 (0.45) AKT1AKT2MEN1HPGDKMT2A
SCHEMBL30089720 0.86 LMNA (0.47) AKT1AKT2SMN1; SMN2L3MBTL1KDM4E
SCHEMBL23264986 0.85 AKT1 (0.36) AKT1AKT2
SCHEMBL21579082 0.84 TDP1 (0.39) AKT1AKT2ALDH1A1TDP1
SCHEMBL14509985 0.84 DPP4 (0.39) MEN1HPGDMAPK1KMT2ASMN1; SMN2
SCHEMBL31734206 0.84 MGAM (0.41) BCHEAKT1AKT2HPGDKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 287 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023136333-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND RESIST PATTERN FORMATION METHOD 旭化成株式会社 2023-07-20 WO claimed
CN-112062721-B HABI photoinitiator capable of improving system stability and application thereof 常州正洁智造科技有限公司 2023-06-30 CN claimed
EP-4192240-A1 AGROCHEMICAL FORMULATIONS BASF SE (DE) 2023-06-14 EP claimed
CN-113667256-B Photochromic materials for head-mounted optical displays, their preparation and use 湖北高碳光电科技有限公司 2023-03-03 CN claimed
CN-111752091-B Application of HABI mixed photoinitiator in UVLED photocuring 常州正洁智造科技有限公司 2022-09-06 CN claimed
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE FUJIFILM CORPORATION (JP) 2026-05-28 US disclosed
CN-122074126-A Photosensitive composition, transfer film, method for producing laminate, and semiconductor package 富士胶片株式会社 2026-05-22 CN disclosed
WO-2026100065-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD 株式会社レゾナック 2026-05-15 WO disclosed
US-12611290-B2 Method for forming and polishing a composite denture IMAM ABDULRAHMAN BIN FAISAL UNIVERSITY (SA) 2026-04-28 US disclosed
US-20260109111-A1 VOLUMETRIC PRINTING OF MULTI-SCALE AND MULTI-MATERIAL STRUCTURES VIA LIGHT INITIATED DIRECT GROWTH LI XIANGJIA (US) 2026-04-23 US disclosed
EP-4291953-B1 IMPROVED BLEACHING XETOS AG (DE) 2026-04-15 EP disclosed
EP-3504251-B1 NETWORK POLYMERS AND METHODS OF MAKING AND USING SAME UNIV COLORADO REGENTS (US) 2026-03-25 EP disclosed
EP-1397392-B1 ADHESIVE DETACKIFICATION METHOD 3M INNOVATIVE PROPERTIES CO (US) 2008-01-16 EP disclosed
US-20070284039-A1 ADHESIVE DETACKIFICATION 3M INNOVATIVE PROPERTIES COMPANY 2007-12-13 US disclosed
US-20070231747-A1 Radiation-sensitive negative resin composition JSR CORPORATION (JP) 2007-10-04 US disclosed
EP-1840654-A1 Radiation-sensitive negative resin composition JSR Corporation (JP) 2007-10-03 EP disclosed
US-7258917-B2 Adhesive detackification 3M INNOVATIVE PROPERTIES COMPANY (US) 2007-08-21 US disclosed
US-20050054785-A1 Adhesive detackification 3M INNOVATIVE PROPERTIES COMPANY 2005-03-10 US disclosed
US-6627309-B2 Mixture of addition polymer, activated by solvent, friction; containg photostabilizer 3M INNOVATIVE PROPERTIES COMPANY 2003-09-30 US disclosed
US-20030054138-A1 Adhesive detackification 3M INNOVATIVE PROPERTIES COMPANY 2003-03-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12611290-B2 Method for forming and polishing a composite denture PML, NUP210, DNMT3A BCHE 4772/4885ACHE 4414/4885AKT1 1106/4885
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE LCP1, PCNA, FDFT1 BCHE 3920/4885ACHE 4564/4885AKT1 530/4885
US-20260109111-A1 VOLUMETRIC PRINTING OF MULTI-SCALE AND MULTI-MATERIAL STRUCTURES VIA LIGHT INITIATED DIRECT GROWTH HTR3D, VCL, VMP1 BCHE 4833/4885ACHE 4337/4885AKT1 1448/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.