Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.61 |
| ▸ | USP2 | O75604 | 1/20 | 0.61 |
| ▸ | GAA | P10253 | 1/20 | 0.61 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.61 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.61 |
| ▸ | CES2 | O00748 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.55 |
| ▸ | CA12 | O43570 | 4/20 | 0.55 |
| ▸ | CA1 | P00915 | 4/20 | 0.55 |
| ▸ | CA2 | P00918 | 4/20 | 0.55 |
| ▸ | CA7 | P43166 | 4/20 | 0.55 |
| ▸ | CA9 | Q16790 | 4/20 | 0.55 |
| ▸ | CA14 | Q9ULX7 | 4/20 | 0.55 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | BACE1 | P56817 | 1/20 | 0.49 |
| ▸ | HPGD | P15428 | 3/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.49 |
| ▸ | NPC1 | O15118 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 2,4-Dihydroxybenzophenone SCHEMBL2052599 | 0.88 | MEN1 (0.83) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL9640012 | 0.88 | CES2 (0.61) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL30678707 | 0.84 | CA12 (0.55) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL1472407 | 0.84 | CA12 (0.55) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL5710221 | 0.83 | MEN1 (0.56) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL30374772 | 0.83 | MEN1 (0.56) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL39507 | 0.83 | CES2 (0.73) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL29357695 | 0.83 | CES2 (0.73) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL1758251 | 0.82 | MEN1 (0.59) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL21935560 | 0.82 | CES2 (0.59) | MEN1KMT2AUSP2GAAKEAP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2006063266-A2 | ADDITIVE AND VEHICLE FOR INKS, PAINTS, COATINGS AND ADHESIVES | OMNITECH ENVIRONMENTAL, LLC (US) | 2006-06-15 | — | — | WO | claimed |
| US-20060128831-A1 | Additive and vehicle for inks, paints, coatings and adhesives | OMNITECH ENVIRONMENTAL, LLC | 2006-06-15 | — | — | US | claimed |
| US-8188184-B2 | Additive and vehicle for inks, paints, coatings and adhesives | OMNITECH ENVIRONMENTAL, LLC (US) | 2012-05-29 | — | — | US | disclosed |
| US-20110086957-A1 | ADDITIVE AND VEHICLE FOR INKS, PAINTS, COATINGS AND ADHESIVES | COOK LEROY JOHN | 2011-04-14 | — | — | US | disclosed |
| US-7863485-B2 | Additive and vehicle for inks, paints, coatings and adhesives | OMNITECH ENVIRONMENTAL, LLC (US) | 2011-01-04 | — | — | US | disclosed |
| WO-2006063266-A2 | ADDITIVE AND VEHICLE FOR INKS, PAINTS, COATINGS AND ADHESIVES | OMNITECH ENVIRONMENTAL, LLC (US) | 2006-06-15 | — | — | WO | disclosed |
| US-20060128831-A1 | Additive and vehicle for inks, paints, coatings and adhesives | OMNITECH ENVIRONMENTAL, LLC | 2006-06-15 | — | — | US | disclosed |
| US-5686557-A | Polyamide resin which can be dissolved in alcohol solvent, composition thereof, and method of use thereof | TOMOEGAWA PAPER CO., LTD. (JP) | 1997-11-11 | — | — | US | disclosed |
| EP-0488686-B1 | A process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORP (US) | 1995-09-27 | — | — | EP | disclosed |
| EP-0508269-B1 | Radiation-sensitive ester and process for its production | HOECHST AG (DE) | 1995-02-01 | — | — | EP | disclosed |
| EP-0369219-B1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AG (DE) | 1995-01-04 | — | — | EP | disclosed |
| US-4902785-A | Phenolic photosensitizers containing quinone diazide and acidic halide substituents | HOECHST CELANESE CORPORATION (US) | 1990-02-20 | — | — | US | disclosed |
| US-4892801-A | PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1990-01-09 | — | — | US | disclosed |
| US-4863827-A | O-QUINONE DIAZIDE | AMERICAN HOECHST CORPORATION (US) | 1989-09-05 | — | — | US | disclosed |
| EP-0264845-A2 | Multilayer positive-registration material | HOECHST CELANESE CORPORATION (US) | 1988-04-27 | — | — | EP | disclosed |
| US-4732836-A | SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| US-4732837-A | Novel mixed ester O-quinone photosensitizers | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| EP-0244762-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0244763-A2 | Positive-working photosensitive composition and photosensitive recording material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0243964-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-04 | — | — | EP | disclosed |