SCHEMBL1472407

SCHEMBL1472407

O=C(c1cc(O)ccc1O)c1c(O)cccc1O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 5/20 0.55
CA1 P00915 5/20 0.55
CA2 P00918 5/20 0.55
CA7 P43166 5/20 0.55
CA9 Q16790 5/20 0.55
CA14 Q9ULX7 5/20 0.55
ALOX5 P09917 1/20 0.55
PTGS2 P35354 1/20 0.55
CHRNA7 P36544 4/20 0.47
SIRT1 Q96EB6 1/20 0.47
GSTA1 P08263 2/20 0.46
LIG1 P18858 1/20 0.46
HSD17B1 P14061 1/20 0.45
HSD17B2 P37059 1/20 0.45
GUSB P08236 1/20 0.45
CYP1A2 P05177 1/20 0.44
CYP2C9 P11712 1/20 0.44
HPGD P15428 1/20 0.44
ALOX15 P16050 1/20 0.44
CASP1 P29466 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30678707 1.00 CA12 (0.55) CA12CA1CA2CA7CA9
SCHEMBL9638908 0.86 CA12 (0.57) CA12CA1CA2CA7CA9
SCHEMBL1614722 0.84 MEN1 (0.61) CA12CA1CA2CA7CA9
SCHEMBL3905124 0.83 CA12 (0.70) CA12CA1CA2CA7CA9
SCHEMBL21936686 0.82 CA12 (0.57) CA12CA1CA2CA7CA9
SCHEMBL21935916 0.82 CA12 (0.57) CA12CA1CA2CA7CA9
SCHEMBL7713693 0.82 GSTA1 (0.67) CA12CA1CA2CA7CA9
SCHEMBL8861157 0.81 CA12 (0.52) CA12CA1CA2CA7CA9
SCHEMBL7551903 0.79 CA12 (0.59) CA12CA1CA2CA7CA9
SCHEMBL8861227 0.79 LIG1 (0.57) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2006063266-A2 ADDITIVE AND VEHICLE FOR INKS, PAINTS, COATINGS AND ADHESIVES OMNITECH ENVIRONMENTAL, LLC (US) 2006-06-15 WO claimed
US-20060128831-A1 Additive and vehicle for inks, paints, coatings and adhesives OMNITECH ENVIRONMENTAL, LLC 2006-06-15 US claimed
US-4425404-A MULTILAYER, PROTECTIVE COATINGS MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1984-01-10 US claimed
US-20240213072-A1 LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE NISSAN CHEMICAL CORPORATION (JP) 2024-06-27 US disclosed
EP-4309893-A1 LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE Nissan Chemical Corporation (JP) 2024-01-24 EP disclosed
EP-4310157-A1 LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING MACHINED SEMICONDUCTOR SUBSTRATE Nissan Chemical Corporation (JP) 2024-01-24 EP disclosed
CN-117157738-A Laminate, stripper composition, and method for producing processed semiconductor substrate 日产化学株式会社 2023-12-01 CN disclosed
CN-117157739-A Laminate, stripper composition, and method for producing processed semiconductor substrate 日产化学株式会社 2023-12-01 CN disclosed
WO-2022210262-A1 LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE 日産化学株式会社 2022-10-06 WO disclosed
US-10607876-B2 Method for processing mold material and method for manufacturing structural body TOKYO OHKA KOGYO CO., LTD. (JP) 2020-03-31 US disclosed
US-10112377-B2 Supporting member separation method and supporting member separation apparatus TOKYO OHKA KOGYO CO., LTD. (JP) 2018-10-30 US disclosed
US-4735848-A PERFLUOROALKYL ESTER LUBRICANT SONY CORPORATION (JP) 1988-04-05 US disclosed
US-4732836-A SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES HOECHST CELANESE CORPORATION (US) 1988-03-22 US disclosed
US-4732837-A Novel mixed ester O-quinone photosensitizers HOECHST CELANESE CORPORATION (US) 1988-03-22 US disclosed
EP-0244763-A2 Positive-working photosensitive composition and photosensitive recording material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-11 EP disclosed
EP-0244762-A2 Photosensitive positive composition and photosensitive registration material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-11 EP disclosed
EP-0243964-A2 Photosensitive positive composition and photosensitive registration material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-04 EP disclosed
EP-0229014-A2 Magnetic recording medium SONY CORPORATION (JP) 1987-07-15 EP disclosed
US-4425404-A MULTILAYER, PROTECTIVE COATINGS MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1984-01-10 US disclosed
EP-0093194-A2 Magnetic recording medium MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1983-11-09 EP disclosed