SCHEMBL1615523

SCHEMBL1615523

CCCCC(N)N1CCN(C(N)CCCC)CC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 2/20 0.39
ALDH1A1 P00352 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
DPP4 P27487 2/20 0.35
DNM1 Q05193 2/20 0.35
DPP7 Q9UHL4 2/20 0.33
FAP Q12884 1/20 0.33
DPP8 Q6V1X1 1/20 0.33
DPP9 Q86TI2 1/20 0.33
SLC1A3 P43003 1/20 0.32
SLC1A2 P43004 1/20 0.32
SLC1A1 P43005 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
SPHK1 Q9NYA1 1/20 0.32
HRH3 Q9Y5N1 1/20 0.32
CHRM2 P08172 1/20 0.32
HTR1A P08908 1/20 0.32
ADRA2A P08913 1/20 0.32
ADORA3 P0DMS8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1615233 0.93 OPRM1 (0.48) OPRM1SLC1A2SLC1A1SPHK1CYP2D6
SCHEMBL28300172 0.91 OPRM1 (0.46) OPRM1SPHK1CYP2D6TP53
SCHEMBL28298745 0.91 OPRM1 (0.46) OPRM1SPHK1CYP2D6TP53
SCHEMBL1614433 0.91 OPRM1 (0.46) OPRM1SPHK1CYP2D6TP53
SCHEMBL1615271 0.91 OPRM1 (0.46) OPRM1SPHK1CYP2D6TP53
SCHEMBL1614413 0.91 OPRM1 (0.46) OPRM1SPHK1CYP2D6TP53
SCHEMBL1614359 0.91 OPRM1 (0.46) OPRM1SPHK1CYP2D6TP53
SCHEMBL2914564 0.91 HRH3 (0.40) OPRM1ALDH1A1TDP1DPP4DNM1
SCHEMBL28298671 0.91 OPRM1 (0.46) OPRM1SPHK1CYP2D6TP53
SCHEMBL28298726 0.89 OPRM1 (0.44) OPRM1SPHK1CYP2D6TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3667418-B1 PHOTOSENSITIVE RESIN COMPOSITION FOR RELIEF PRINTING ORIGINAL PLATE AND RELIEF PRINTING ORIGINAL PLATE USING THE SAME TOYOBO MC CORP (JP) 2024-02-21 EP disclosed
US-11020999-B2 Photosensitive resin composition for relief printing original plate and relief printing original plate using the same TOYOBO CO., LTD. (JP) 2021-06-01 US disclosed
US-20200247169-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR RELIEF PRINTING ORIGINAL PLATE AND RELIEF PRINTING ORIGINAL PLATE USING THE SAME TOYOBO CO., LTD. (JP) 2020-08-06 US disclosed
EP-3667418-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR RELIEF PRINTING ORIGINAL PLATE, AND RELIEF PRINTING ORIGINAL PLATE USING SAME Toyobo Co., Ltd. (JP) 2020-06-17 EP disclosed
US-8338065-B2 Electrophotographic photoreceptor and image forming apparatus provided with the same SHARP KABUSHIKI KAISHA (JP) 2012-12-25 US disclosed
US-20110085823-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND IMAGE FORMING APPARATUS PROVIDED WITH THE SAME SHARP KABUSHIKI KAISHA (JP) 2011-04-14 US disclosed