SCHEMBL1615832

SCHEMBL1615832

CO[Si](OC)(OC)c1cc2ccccc2c2ccccc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPM4 Q8TD43 1/20 0.42
ALDH1A1 P00352 7/20 0.41
HSD17B10 Q99714 3/20 0.41
HIF1A Q16665 1/20 0.41
CYP1B1 Q16678 1/20 0.41
KDM4E B2RXH2 4/20 0.40
HPGD P15428 3/20 0.40
NPSR1 Q6W5P4 1/20 0.40
POLB P06746 1/20 0.39
HPRT1 P00492 1/20 0.39
NISCH Q9Y2I1 1/20 0.39
SMN1; SMN2 Q16637 2/20 0.38
MAPK1 P28482 1/20 0.38
CYP2A6 P11509 2/20 0.37
TSHR P16473 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
CYP1A2 P05177 3/20 0.37
CYP11B1 P15538 1/20 0.37
MEN1 O00255 1/20 0.37
CYP3A4 P08684 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26268819 0.82 TRPM4 (0.41) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL1640203 0.81 POLB (0.37) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL2546879 0.81 HPRT1 (0.52) ALDH1A1HSD17B10HIF1ACYP1B1HPGD
SCHEMBL20872881 0.79 TRPM4 (0.38) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL1929080 0.79 TRPM4 (0.38) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL20466119 0.78 KDM4E (0.48) ALDH1A1KDM4EHPGDPOLBSMN1; SMN2
SCHEMBL25393092 0.78 TRPM4 (0.37) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL30607251 0.78 TRPM4 (0.37) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL6744204 0.76 CYP1A2 (0.47) ALDH1A1HSD17B10CYP1B1KDM4EHPGD
SCHEMBL2346357 0.75 POLB (0.42) ALDH1A1HSD17B10HIF1ACYP1B1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 139 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025022873-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND FINGERPRINT AUTHENTICATION DEVICE USING SAID CURED FILM 東レ株式会社 2025-01-30 WO disclosed
CN-111538209-B Photosensitive resin composition, organic EL element partition wall, and organic EL element 日保丽公司 2024-05-14 CN disclosed
CN-117859098-A Photosensitive resin composition and microlens 东丽株式会社 2024-04-09 CN disclosed
US-20240045329-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND TORAY INDUSTRIES, INC. (JP) 2024-02-08 US disclosed
CN-116802559-A Photosensitive resin composition, cured film, electronic component, antenna element, semiconductor package, and compound 东丽株式会社 2023-09-22 CN disclosed
US-11733609-B2 Silicon-containing underlayers ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-08-22 US disclosed
EP-3617758-B1 COMPOSITION FOR FORMING OPTICAL WAVEGUIDE WHICH CONTAINS REACTIVE SILSESQUIOXANE COMPOUND NISSAN CHEMICAL CORP (JP) 2023-08-09 EP disclosed
US-11650499-B2 Photosensitive resin composition, organic EL element barrier rib, and organic EL element SHOWA DENKO K.K. (JP) 2023-05-16 US disclosed
US-11640110-B2 Resin composition, method for producing heat-resistant resin film, and display device TORAY INDUSTRIES, INC. (JP) 2023-05-02 US disclosed
US-11599023-B2 Photosensitive resin composition, organic EL element barrier rib, and organic EL element SHOWA DENKO K.K. (JP) 2023-03-07 US disclosed
CN-102472964-A Positive photosensitive resin composition, cured film obtained using same, and optical device TORAY INDUSTRIES 2012-05-23 CN disclosed
EP-1873189-B1 SILICONE COPOLYMER HAVING CONDENSED POLYCYCLIC HYDROCARBON GROUP TOKYO OHKA KOGYO CO LTD (JP) 2011-08-10 EP disclosed
US-7923524-B2 Silicone copolymer having condensed polycyclic hydrocarbon group TOKYO OHKA KOGYO CO., LTD. (JP) 2011-04-12 US disclosed
US-20090253886-A1 SILICONE COPOLYMER HAVING CONDENSED POLYCYCLIC HYDROCARBON GROUP TOKYO OHKA KOGYO CO., LTD. (JP) 2009-10-08 US disclosed
EP-1873189-A1 SILICONE COPOLYMER HAVING CONDENSED POLYCYCLIC HYDROCARBON GROUP TOKYO OHKA KOGYO CO., LTD. (JP) 2008-01-02 EP disclosed
EP-0909406-B1 PHOTOMASK BLANKS DU PONT (US) 2001-11-21 EP disclosed
US-6174631-B1 POLYMERIC TRANSMISSIVE ATTENUATED EMBEDDED PHASE SHIFTER PHOTOMASK COMPRISING AT LEAST ONE POLYMERIC MATERIAL SELECTED FROM THE GROUP CONSISTING OF POLYSILOXANE POLYMERS AND POLYSILOXANE POLYMERS DOPED WITH A CHROMOPHORE E. I. DU PONT DE NEMOURS AND COMPANY 2001-01-16 US disclosed
US-6096460-A TRANSMISSIVE ATTENUATED EMBEDDED PHASE SHIFTER PHOTOMASKS COMPRISING A POLYMER, PREFERABLY AN AMORPHOUS FLUOROPOLYMER DOPED WITH A FLUORINE FUNCTIONALIZED ORGANOSILANE AND ORGANOSILICATES E. I. DU PONT DE NEMOURS AND COMPANY (US) 2000-08-01 US disclosed
EP-0909406-A1 PHOTOMASK BLANKS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1999-04-21 EP disclosed
WO-1998000758-A1 PHOTOMASK BLANKS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1998-01-08 WO disclosed