SCHEMBL16200802

SCHEMBL16200802

CCC(C)(C)C(=O)OC1C2CC3COC1CC(C3)C2

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.32
HSD11B1 P28845 5/20 0.32
CYP2C9 P11712 1/20 0.32
HMGCR P04035 1/20 0.31
FKBP1A P62942 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6722085 0.84 HSD11B1 (0.41) EPHX1HSD11B1CYP2C9HMGCRFKBP1A
SCHEMBL13449670 0.77 HMGCR (0.34) HMGCR
SCHEMBL18799638 0.77 HMGCR (0.34) HMGCR
SCHEMBL13563615 0.75 CYP3A4 (0.31) HMGCR
SCHEMBL17752193 0.74 HSD11B1 (0.36) EPHX1HSD11B1CYP2C9HMGCRFKBP1A
SCHEMBL14616406 0.74 BCHE (0.36) HSD11B1
SCHEMBL12365220 0.72 HMGCR (0.33) HSD11B1HMGCR
SCHEMBL13430191 0.71 HMGCR (0.37) HMGCR
SCHEMBL133364 0.71 HMGCR (0.31) HMGCR
SCHEMBL47501 0.71 HSD11B1 (0.33) EPHX1HSD11B1HMGCRFKBP1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140322650-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-30 US disclosed
US-20140322650-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-30 US disclosed