Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 10/20 | 0.41 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.39 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | HMGCR | P04035 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17752193 | 0.89 | HSD11B1 (0.36) | HSD11B1EPHX1FKBP1ACYP2C9EPHX2 | |
| SCHEMBL11948900 | 0.84 | HSD11B1 (0.36) | HSD11B1EPHX1FKBP1ACYP2C9EPHX2 | |
| SCHEMBL13430234 | 0.84 | HMGCR (0.36) | HMGCR | |
| SCHEMBL16200802 | 0.84 | EPHX1 (0.32) | HSD11B1EPHX1FKBP1ACYP2C9HMGCR | |
| SCHEMBL20101400 | 0.83 | HMGCR (0.33) | FKBP1AHMGCR | |
| SCHEMBL12365220 | 0.83 | HMGCR (0.33) | HSD11B1HMGCR | |
| SCHEMBL19976016 | 0.83 | HSD11B1 (0.39) | HSD11B1EPHX1FKBP1ACYP2C9EPHX2 | |
| SCHEMBL13430191 | 0.82 | HMGCR (0.37) | HMGCR | |
| SCHEMBL11948956 | 0.82 | HSD11B1 (0.36) | HSD11B1EPHX1FKBP1ACYP2C9EPHX2 | |
| SCHEMBL11948961 | 0.82 | HSD11B1 (0.35) | HSD11B1EPHX1FKBP1ACYP2C9EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170349686-A1 | PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-9835945-B2 | Positive resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2017-12-05 | — | — | US | disclosed |
| US-9698014-B2 | Photoresist composition to reduce photoresist pattern collapse | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD (TW) | 2017-07-04 | — | — | US | disclosed |
| US-9698014-B2 | Photoresist composition to reduce photoresist pattern collapse | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD (TW) | 2017-07-04 | — | — | US | disclosed |
| US-20170123318-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME | FUJIFILM CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |
| US-9541831-B2 | Positive resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2017-01-10 | — | — | US | disclosed |
| US-20160320699-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-03 | — | — | US | disclosed |
| US-20160033863-A1 | PHOTORESIST COMPOSITION TO REDUCE PHOTORESIST PATTERN COLLAPSE | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD (TW) | 2016-02-04 | — | — | US | disclosed |
| US-20160033863-A1 | PHOTORESIST COMPOSITION TO REDUCE PHOTORESIST PATTERN COLLAPSE | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD (TW) | 2016-02-04 | — | — | US | disclosed |
| US-20150331314-A1 | PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-11-19 | — | — | US | disclosed |
| US-20100167201-A1 | RESIST COMPOSITION FOR NEGATIVE TONE DEVELOPMENT AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20090136878-A1 | TOPCOAT COMPOSITION, ALKALI DEVELOPER-SOLUBLE TOPCOAT FILM USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-05-28 | — | — | US | disclosed |
| US-20090136878-A1 | TOPCOAT COMPOSITION, ALKALI DEVELOPER-SOLUBLE TOPCOAT FILM USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-05-28 | — | — | US | disclosed |
| US-20080305433-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME | FUJIFILM CORPORATION (JP) | 2008-12-11 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080137206-A1 | Film, Manufacturing Method Thereof, Polarization Plate Using the Film, and Liquid Crystal, and Display Device Using the Polarizing Plate | FUJIFILM CORPORATION (JP) | 2008-06-12 | — | — | US | disclosed |
| US-7368220-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2008-05-06 | — | — | US | disclosed |
| US-20070178405-A1 | Positive resist composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2007-08-02 | — | — | US | disclosed |
| US-20070148589-A1 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2007-06-28 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150331314-A1 | PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | RER1, CROCC, RFT1 | HSD11B1 4273/4885EPHX1 10/4885FKBP1A 4743/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.