SCHEMBL16200810

SCHEMBL16200810

CCCOc1ccc([S+]([O-])c2ccccc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 4/20 0.50
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
CA7 P43166 1/20 0.46
CA9 Q16790 1/20 0.46
MAPT P10636 3/20 0.42
NPC1 O15118 2/20 0.42
RAB9A P51151 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
HPGD P15428 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
LMNA P02545 1/20 0.42
MAPK1 P28482 1/20 0.42
KCNA3 P22001 1/20 0.42
NFKB1 P19838 1/20 0.41
NFKB2 Q00653 1/20 0.41
RELA Q04206 1/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2785953 0.93 CA12 (0.52) LTA4HCA12CA1CA2CA7
SCHEMBL16195402 0.88 LTA4H (0.60) LTA4HSMN1; SMN2LMNAMAPK1KCNA3
SCHEMBL16200799 0.85 LTA4H (0.57) LTA4HCA12CA1CA2CA7
SCHEMBL2787890 0.85 LTA4H (0.52) LTA4HCA12CA1CA2CA7
SCHEMBL16200807 0.84 CA12 (0.45) LTA4HCA12CA1CA2CA7
SCHEMBL16195300 0.84 MAPT (0.42) LTA4HMAPTNPC1RAB9ASMN1; SMN2
SCHEMBL23095528 0.81 HTR1B (0.66) L3MBTL1LMNAMEN1KMT2ACHRNB2
Hydrochloric Acid SCHEMBL20543314 0.81 TAAR1 (0.60) LTA4HRAB9ASMN1; SMN2MAPK1KCNA3
SCHEMBL16194924 0.80 KDM4E (0.44) LTA4HMAPTNPC1RAB9ASMN1; SMN2
SCHEMBL9336687 0.80 NR5A1 (0.59) LTA4HCA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9164384-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-20 US disclosed
US-20140322650-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-30 US disclosed