SCHEMBL16200799

SCHEMBL16200799

CCOc1ccc([S+]([O-])c2ccccc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 2/20 0.57
NQO1 P15559 1/20 0.54
RELA Q04206 1/20 0.52
TSHR P16473 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
MAPT P10636 2/20 0.45
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
SMN1; SMN2 Q16637 4/20 0.45
NPC1 O15118 3/20 0.45
RAB9A P51151 3/20 0.45
HPGD P15428 3/20 0.45
ALDH1A1 P00352 2/20 0.45
TP53 P04637 2/20 0.45
KDM4E B2RXH2 1/20 0.45
KIF11 P52732 1/20 0.44
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
CA7 P43166 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2786031 0.92 NQO1 (0.64) LTA4HNQO1RELATSHRTDP1
SCHEMBL16200810 0.85 LTA4H (0.50) LTA4HRELAMAPTMEN1KMT2A
SCHEMBL243140 0.84 LTA4H (0.61) LTA4HNQO1RELATSHRTDP1
SCHEMBL16195402 0.81 LTA4H (0.60) LTA4HTSHRSMN1; SMN2ALDH1A1TP53
SCHEMBL16195300 0.80 MAPT (0.42) LTA4HMAPTMEN1KMT2ASMN1; SMN2
(Phenylsulfinyl)Benzene SCHEMBL7194218 0.79 LTA4H (0.34) LTA4HRELATSHRSMN1; SMN2RAB9A
SCHEMBL8771988 0.79 LMNA (0.58) LTA4HMAPTSMN1; SMN2RAB9ACA12
SCHEMBL23907137 0.78 NQO1 (0.44) LTA4HNQO1RELATSHRTDP1
SCHEMBL6395440 0.78 CA4 (0.54) LTA4HTDP1KMT2ANPC1RAB9A
SCHEMBL11881563 0.78 NQO1 (0.61) LTA4HNQO1RELATSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9164384-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-20 US disclosed
US-20140322650-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-30 US disclosed