SCHEMBL16201611

SCHEMBL16201611

CCC(C)(C)Oc1c(C)cc(C(C)(C)CC)cc1C

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 4/20 0.36
RAB9A P51151 3/20 0.36
SMN1; SMN2 Q16637 3/20 0.36
NPC1 O15118 2/20 0.36
LMNA P02545 1/20 0.36
CASP3 P42574 1/20 0.36
ATM Q13315 1/20 0.36
SENP8 Q96LD8 1/20 0.36
SENP7 Q9BQF6 1/20 0.36
SENP6 Q9GZR1 1/20 0.36
MAPT P10636 3/20 0.34
ESR1 P03372 2/20 0.32
ESR2 Q92731 2/20 0.32
NPSR1 Q6W5P4 3/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
GLA P06280 1/20 0.32
HTT P42858 1/20 0.32
UBE2N P61088 1/20 0.32
ALDH1A1 P00352 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14629625 0.86 ESR1 (0.33) ESR1ESR2ALDH1A1TSHRTDP1
SCHEMBL16207347 0.86 POLB (0.40) MAPK1RAB9ALMNAATMMAPT
SCHEMBL16201698 0.86 MAPK1 (0.37) MAPK1RAB9ASMN1; SMN2NPC1LMNA
SCHEMBL16207348 0.84 MAPK1 (0.36) MAPK1RAB9ASMN1; SMN2NPC1LMNA
SCHEMBL14011198 0.83 GLA (0.37) MAPTESR1ESR2KMT2AGLA
SCHEMBL16201699 0.82 CYP3A4 (0.30)
SCHEMBL14325350 0.79 ALDH1A1 (0.42) MAPK1RAB9ASMN1; SMN2NPC1LMNA
SCHEMBL19354009 0.78 ALDH1A1 (0.34) MAPTESR1ESR2GLAALDH1A1
SCHEMBL12636687 0.74 NPC1 (0.35) MAPK1RAB9ASMN1; SMN2NPC1LMNA
SCHEMBL780091 0.72 NPC1 (0.43) MAPK1RAB9ASMN1; SMN2NPC1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9642249-B2 Resin composition, prepreg, and substrate employing the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2017-05-02 US disclosed
US-20140322545-A1 RESIN COMPOSITION, PREPREG, AND SUBSTRATE EMPLOYING THE SAME INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2014-10-30 US disclosed