SCHEMBL16243722

SCHEMBL16243722

C=C(C)C(=O)OC(C)Cc1cc(C(=O)O)ccc1C(=O)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.42
APEX1 P27695 1/20 0.42
HTT P42858 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
ACE2 Q9BYF1 4/20 0.40
MYC P01106 1/20 0.35
KDM4E B2RXH2 3/20 0.35
ALDH1A1 P00352 2/20 0.35
TSHR P16473 2/20 0.35
GAA P10253 1/20 0.35
RAB9A P51151 1/20 0.35
ELANE P08246 1/20 0.35
RXRA P19793 2/20 0.34
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA4 P22748 1/20 0.33
CA6 P23280 1/20 0.33
CA7 P43166 1/20 0.33
TPMT P51580 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4579641 0.88 CA12 (0.38) POLBAPEX1HTTTDP1MYC
SCHEMBL11130479 0.85 ALDH1A1 (0.34) POLBAPEX1HTTTDP1ALDH1A1
SCHEMBL28928014 0.81 ACE2 (0.40) ACE2MYCKDM4EALDH1A1TSHR
SCHEMBL10414804 0.79 ALDH1A1 (0.31) POLBAPEX1HTTTDP1ALDH1A1
SCHEMBL244340 0.77 PRKCG (0.36) TDP1KDM4EALDH1A1TSHRELANE
SCHEMBL1356439 0.76 ACE2 (0.50) ACE2MYCKDM4EALDH1A1TSHR
SCHEMBL8733208 0.76 TSHR (0.41) TSHRRAB9AELANE
SCHEMBL11130478 0.75 MAPT (0.41) POLBAPEX1HTTTDP1ACE2
SCHEMBL1535487 0.75 HTT (0.57) POLBAPEX1HTTTDP1ACE2
SCHEMBL9192807 0.75 ACE2 (0.49) POLBACE2MYCKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9177819-B2 Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPORATION (JP) 2015-11-03 US disclosed
US-20140349485-A1 METHOD FOR MANUFACTURING SILICON SUBSTRATE HAVING TEXTURED STRUCTURE TOKUYAMA CORPORATION a corporation 2014-11-27 US disclosed