SCHEMBL16243732

SCHEMBL16243732

C=C(C)C(=O)OCCCOC(=O)c1cccc2cccc(C(=O)O)c12

nearest known ligand 0.49

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 5/20 0.46
POLB P06746 2/20 0.46
APEX1 P27695 1/20 0.46
HTT P42858 1/20 0.46
TSHR P16473 7/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
HSD17B10 Q99714 3/20 0.42
CYP3A4 P08684 2/20 0.41
MAPK1 P28482 2/20 0.41
KDM4E B2RXH2 2/20 0.41
MAPT P10636 1/20 0.41
TP53 P04637 1/20 0.41
ALDH1A1 P00352 5/20 0.40
LMNA P02545 1/20 0.40
HRH3 Q9Y5N1 2/20 0.39
DRD3 P35462 1/20 0.37
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16243886 0.95 HSD17B10 (0.44) TDP1POLBAPEX1HTTTSHR
SCHEMBL194453 0.85 TSHR (0.55) TDP1POLBAPEX1HTTTSHR
SCHEMBL28304537 0.84 TSHR (0.54) TDP1POLBAPEX1HTTTSHR
SCHEMBL16243887 0.84 HSD17B10 (0.41) TDP1POLBAPEX1HTTTSHR
SCHEMBL16243790 0.83 TDP1 (0.50) TDP1POLBAPEX1HTTTSHR
SCHEMBL27412533 0.82 TSHR (0.64) TDP1POLBTSHRL3MBTL1HSD17B10
SCHEMBL194750 0.82 TSHR (0.58) TDP1POLBAPEX1HTTTSHR
SCHEMBL645003 0.82 TSHR (0.62) TDP1POLBAPEX1HTTTSHR
SCHEMBL1173737 0.82 TDP1 (0.51) TDP1POLBAPEX1HTTTSHR
SCHEMBL10387045 0.81 TSHR (0.65) TDP1POLBTSHRL3MBTL1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9177819-B2 Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPORATION (JP) 2015-11-03 US disclosed
US-20140349485-A1 METHOD FOR MANUFACTURING SILICON SUBSTRATE HAVING TEXTURED STRUCTURE TOKUYAMA CORPORATION a corporation 2014-11-27 US disclosed