SCHEMBL16243790

SCHEMBL16243790

C=C(C)C(=O)OCCCOC(=O)c1cc2ccccc2cc1C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 5/20 0.50
POLB P06746 1/20 0.50
APEX1 P27695 1/20 0.50
HTT P42858 1/20 0.50
TSHR P16473 7/20 0.43
L3MBTL1 Q9Y468 2/20 0.43
ALDH1A1 P00352 6/20 0.42
CYP3A4 P08684 2/20 0.42
MAPK1 P28482 2/20 0.42
KDM4E B2RXH2 2/20 0.42
HPGD P15428 1/20 0.42
TP53 P04637 1/20 0.42
LMNA P02545 2/20 0.41
HSD17B10 Q99714 1/20 0.39
IDO1 P14902 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
KMT2A Q03164 1/20 0.38
APP P05067 1/20 0.38
MAPT P10636 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16243539 0.95 TDP1 (0.46) TDP1POLBAPEX1HTTTSHR
SCHEMBL194453 0.86 TSHR (0.55) TDP1POLBAPEX1HTTTSHR
SCHEMBL28304537 0.85 TSHR (0.54) TDP1POLBAPEX1HTTTSHR
SCHEMBL194750 0.83 TSHR (0.58) TDP1POLBAPEX1HTTTSHR
SCHEMBL16243732 0.83 TDP1 (0.46) TDP1POLBAPEX1HTTTSHR
SCHEMBL16243761 0.83 MAPK1 (0.44) TDP1POLBAPEX1HTTTSHR
SCHEMBL645003 0.83 TSHR (0.62) TDP1POLBAPEX1HTTTSHR
SCHEMBL4087259 0.83 THRB (0.47) TDP1POLBAPEX1HTTTSHR
SCHEMBL1556947 0.83 THRB (0.47) TDP1POLBAPEX1HTTTSHR
SCHEMBL7080186 0.83 THRB (0.47) TDP1POLBAPEX1HTTTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9177819-B2 Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPORATION (JP) 2015-11-03 US disclosed
US-20140349485-A1 METHOD FOR MANUFACTURING SILICON SUBSTRATE HAVING TEXTURED STRUCTURE TOKUYAMA CORPORATION a corporation 2014-11-27 US disclosed