SCHEMBL16243779

SCHEMBL16243779

C=CC(=O)OCCC(O)OC(=O)C(=C)C

nearest known ligand 0.43

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 10/20 0.43
HPGD P15428 1/20 0.43
ALDH1A1 P00352 6/20 0.43
TP53 P04637 3/20 0.43
HIF1A Q16665 3/20 0.43
CYP3A4 P08684 2/20 0.43
HSD17B10 Q99714 1/20 0.43
THRB P10828 3/20 0.37
MAPK1 P28482 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25309314 0.87 THRB (0.42) TSHRHPGDALDH1A1TP53HIF1A
Methacrylic Acid SCHEMBL28331805 0.86 TSHR (0.42) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL4900588 0.84 THRB (0.48) TSHRALDH1A1THRB
SCHEMBL10879521 0.84 TSHR (0.43) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL2284196 0.83 TSHR (0.52) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL15741730 0.82 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL9776637 0.81 TSHR (0.61) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL9840052 0.81 TSHR (0.36) TSHRHPGDALDH1A1THRB
SCHEMBL8528315 0.81 TSHR (0.44) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL27542565 0.79 TSHR (0.47) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114730132-B Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin 富士胶片株式会社 2025-05-09 CN disclosed
CN-119937247-A Curable resin composition, resin film, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2025-05-06 CN disclosed
CN-114761466-B Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin 富士胶片株式会社 2024-12-10 CN disclosed
CN-117836916-A Method for producing cured product, method for producing laminate, method for producing semiconductor device, treatment liquid, and resin composition 富士胶片株式会社 2024-04-05 CN disclosed
US-11807768-B2 Inkjet ink, hiding layer coating agent, recording sheet and method for manufacturing the same, recorded product and method for manufacturing the same, and image recording ink GENERAL CO., LTD. (JP) 2023-11-07 US disclosed
CN-116710282-A Resin composition, cured product, laminate, method for producing cured product, semiconductor device, and compound 富士胶片株式会社 2023-09-05 CN disclosed
CN-116635453-A Method for producing cured product, method for producing laminate, method for producing semiconductor device, and treatment liquid 富士胶片株式会社 2023-08-22 CN disclosed
WO-2023140263-A1 THERMALLY EXPANDABLE MICROSPHERES, HOLLOW PARTICLES, AND USE THEREOF 松本油脂製薬株式会社 2023-07-27 WO disclosed
CN-116234845-A Method for producing cured product, method for producing laminate, and method for producing semiconductor device 富士胶片株式会社 2023-06-06 CN disclosed
CN-116113884-A Method for producing cured product, method for producing laminate, and method for producing electronic device 富士胶片株式会社 2023-05-12 CN disclosed
CN-116075777-A Method for producing cured product, method for producing laminate, and method for producing semiconductor device 富士胶片株式会社 2023-05-05 CN disclosed
CN-115989457-A Method for producing cured product, method for producing laminate, and method for producing semiconductor device 富士胶片株式会社 2023-04-18 CN disclosed
CN-115867866-A Method for producing cured product, resin composition, developer, method for producing laminate, and method for producing semiconductor device 富士胶片株式会社 2023-03-28 CN disclosed
CN-114761466-A Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin 富士胶片株式会社 2022-07-15 CN disclosed
CN-114730132-A Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin 富士胶片株式会社 2022-07-08 CN disclosed
CN-107739439-A A kind of preparation method of hyperbranched poly thioether 江南大学 2018-02-27 CN disclosed
US-20140349230-A1 TONER FOR ELECTROSTATIC IMAGE DEVELOPMENT, TWO-COMPONENT DEVELOPER, AND IMAGE FORMATION PROCESS Konica Minolta, Inc. (JP) 2014-11-27 US disclosed