SCHEMBL1626490

SCHEMBL1626490

CC1C(C)C2CC1C(C(C)(O)C(F)(F)F)C2C(C)(O)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12369829 0.79
SCHEMBL12193730 0.78
SCHEMBL16904976 0.72 PDK1 (0.33)
SCHEMBL1626376 0.71
SCHEMBL18288148 0.70
SCHEMBL12193695 0.70 PDK1 (0.37)
SCHEMBL12193701 0.68 PDK1 (0.36)
SCHEMBL12193712 0.68 CYP2C9 (0.35)
SCHEMBL12193728 0.67
SCHEMBL12193729 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9458343-B2 Method of forming patterns FUJIFILM CORPORATION (JP) 2016-10-04 US disclosed
US-20160009936-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2016-01-14 US disclosed
US-20150338743-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-11-26 US disclosed
US-9176386-B2 Method of forming patterns FUJIFILM CORPORATION (JP) 2015-11-03 US disclosed
US-20150044616-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2015-02-12 US disclosed
US-8895225-B2 Method of forming patterns FUJIFILM CORPORATION (JP) 2014-11-25 US disclosed
US-20140080068-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2014-03-20 US disclosed
US-20120088194-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2012-04-12 US disclosed
US-20110020755-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2011-01-27 US disclosed