SCHEMBL16285462

SCHEMBL16285462

O=S1(=O)OC(c2ccc(O)cc2O)(c2ccc(O)cc2O)c2ccccc21

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.66
KMT2A Q03164 5/20 0.66
LMNA P02545 4/20 0.66
CYP2C9 P11712 3/20 0.66
CYP1A2 P05177 1/20 0.66
HIF1A Q16665 1/20 0.66
TDP1 Q9NUW8 3/20 0.62
CYP3A4 P08684 3/20 0.62
ALDH1A1 P00352 3/20 0.62
PTPN11 Q06124 2/20 0.62
MAPK1 P28482 1/20 0.62
CDK2 P24941 1/20 0.55
MAPT P10636 3/20 0.38
HPGD P15428 3/20 0.38
CYP2C19 P33261 2/20 0.38
GPR55 Q9Y2T6 2/20 0.38
ALOX12 P18054 2/20 0.38
FTO Q9C0B1 2/20 0.38
POLB P06746 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16286113 0.92 MEN1 (0.76) MEN1KMT2ALMNACYP2C9CYP1A2
SCHEMBL220836 0.85 TDP1 (0.71) MEN1KMT2ALMNACYP2C9CYP1A2
SCHEMBL29588980 0.85 MEN1 (0.62) MEN1KMT2ALMNACYP2C9CYP1A2
SCHEMBL410463 0.85 TDP1 (0.67) MEN1KMT2ALMNACYP2C9CYP1A2
SCHEMBL29369363 0.85 TDP1 (0.71) MEN1KMT2ALMNACYP2C9CYP1A2
SCHEMBL15836279 0.85 MEN1 (0.62) MEN1KMT2ALMNACYP2C9CYP1A2
SCHEMBL4634262 0.84 TDP1 (0.65) MEN1KMT2ALMNACYP2C9CYP1A2
SCHEMBL3398015 0.81 PTPN11 (0.78) MEN1KMT2ALMNACYP2C9CYP1A2
SCHEMBL3422255 0.80 PTPN11 (0.76) MEN1KMT2ALMNACYP2C9CYP1A2
Phenolsulfonphthalein SCHEMBL17836 0.80 MEN1 (1.00) MEN1KMT2ALMNACYP2C9CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10228621-B2 Underlayer film-forming composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-12 US disclosed
US-20140363955-A1 UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-11 US disclosed