Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 3/20 | 0.44 |
| ▸ | CYP4A11 | Q02928 | 3/20 | 0.44 |
| ▸ | PRKCA | P17252 | 1/20 | 0.36 |
| ▸ | HMGCR | P04035 | 3/20 | 0.36 |
| ▸ | PKM | P14618 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | RIPK1 | Q13546 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL824523 | 0.82 | CYP4F2 (0.41) | CYP4F2CYP4A11HMGCRALDH1A1THRB | |
| SCHEMBL130722 | 0.82 | CYP4F2 (0.55) | CYP4F2CYP4A11PKMKDM4EALDH1A1 | |
| SCHEMBL15803755 | 0.82 | CYP4F2 (0.41) | CYP4F2CYP4A11PRKCA | |
| SCHEMBL5021627 | 0.82 | CYP4F2 (0.41) | CYP4F2CYP4A11HMGCRPKMALDH1A1 | |
| SCHEMBL75751 | 0.81 | CYP4F2 (0.46) | CYP4F2CYP4A11PRKCAHMGCRPKM | |
| SCHEMBL15805656 | 0.81 | CYP4F2 (0.38) | CYP4F2CYP4A11PRKCA | |
| Ammonia Solution, Strong SCHEMBL27912168 | 0.80 | CYP4F2 (0.53) | CYP4F2CYP4A11PKMKDM4EALDH1A1 | |
| SCHEMBL12634175 | 0.80 | PRKCA (0.41) | CYP4F2CYP4A11PRKCAPKMKDM4E | |
| SCHEMBL13296226 | 0.80 | CYP4F2 (0.39) | CYP4F2CYP4A11HMGCRALDH1A1LMNA | |
| SCHEMBL2179864 | 0.80 | CYP4F2 (0.39) | CYP4F2CYP4A11HMGCRALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180181003-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20180180996-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2018-06-28 | — | — | US | disclosed |
| US-9891777-B2 | Method for manufacturing touch-panel conductive sheet, and touch-panel conductive sheet | FUJIFILM CORPORATION (JP) | 2018-02-13 | — | — | US | disclosed |
| US-9820380-B2 | Transparent conductive film and method for producing transparent conductive film | FUJIFILM CORPORATION (JP) | 2017-11-14 | — | — | US | disclosed |
| US-9820377-B2 | Methods for producing a transparent conductive film for a touch panel | FUJIFILM CORPORATION (JP) | 2017-11-14 | — | — | US | disclosed |
| US-20170266694-A1 | SURFACE TREATMENT METHOD, ANTI-STATIC AGENT, AND HYDROPHILIZING TREATMENT AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-09-21 | — | — | US | disclosed |
| US-9758630-B2 | Polymer substrate with hard coat layer and manufacturing method for such polymer substrate | TEIJIN LIMITED (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20170176862-A1 | PATTERN FORMING METHOD, COMPOSITION FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-22 | — | — | US | disclosed |
| US-20170171972-A1 | TRANSPARENT CONDUCTIVE FILM AND METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM | FUJIFILM CORPORATION (JP) | 2017-06-15 | — | — | US | disclosed |
| US-20170107345-A1 | POLYMER SUBSTRATE WITH HARD COAT LAYER AND MANUFACTURING METHOD FOR SUCH POLYMER SUBSTRATE | TEIJIN LIMITED (JP) | 2017-04-20 | — | — | US | disclosed |
| US-20140080068-A1 | METHOD OF FORMING PATTERNS | FUJIFILM CORPORATION (JP) | 2014-03-20 | — | — | US | disclosed |
| US-20130165557-A1 | LAMINATE OF AN ACRYLIC RESIN COMPOSITION LAYER CONTAINING TRIAZINE BASED ULTRA-VIOLET COMPOUNDS AND AN ORGANOSILOXANE RESIN COMPOSITION LAYER | TEIJIN CHEMICALS, LTD. (JP) | 2013-06-27 | — | — | US | disclosed |
| US-20130165570-A1 | LAMINATE OF AN ACRYLIC RESIN COMPOSITION LAYER CONTAINING TRIAZINE BASED ULTRA-VIOLET COMPOUNDS AND AN ORGANOSILOXANE RESIN COMPOSITION LAYER | TEIJIN CHEMICALS, LTD. (JP) | 2013-06-27 | — | — | US | disclosed |
| US-8404349-B2 | Laminate of an acrylic resin composition layer containing triazine based ultra-violet compounds and an organosiloxane resin composition layer | TEIJIN CHEMICALS, LTD. (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20120296029-A1 | FLUORINE-CONTAINING MULTIFUNCTIONAL MICROSPHERES AND USES THEREOF | QUEEN'S UNIVERSITY AT KINGSTON (CA) | 2012-11-22 | — | — | US | disclosed |
| US-20120264054-A1 | PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-10-18 | — | — | US | disclosed |
| US-20120088194-A1 | METHOD OF FORMING PATTERNS | FUJIFILM CORPORATION (JP) | 2012-04-12 | — | — | US | disclosed |
| US-7998655-B2 | Method of forming patterns | FUJIFILM CORPORATION (JP) | 2011-08-16 | — | — | US | disclosed |
| US-7947795-B2 | Polymer for filling gaps in semiconductor substrate and coating composition using the same | CHEIL INDUSTRIES INC. (KR) | 2011-05-24 | — | — | US | disclosed |
| US-20090042147-A1 | METHOD OF FORMING PATTERNS | FUJIFILM CORPORATION (JP) | 2009-02-12 | — | — | US | disclosed |