SCHEMBL130722

SCHEMBL130722

CCOC(=O)C(C)(C)CC

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 3/20 0.55
CYP4A11 Q02928 3/20 0.55
ALDH1A1 P00352 3/20 0.46
LMNA P02545 1/20 0.43
HSD17B10 Q99714 1/20 0.43
PKM P14618 3/20 0.42
MMP8 P22894 2/20 0.42
KDM4E B2RXH2 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
ALOX15 P16050 1/20 0.42
MGAM O43451 1/20 0.42
GAA P10253 1/20 0.42
SI P14410 1/20 0.42
MGAM2 Q2M2H8 1/20 0.42
SOAT1 P35610 1/20 0.42
THRB P10828 1/20 0.41
ABCB11 O95342 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL27912168 0.97 CYP4F2 (0.53) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL14649752 0.84 GAA (0.44) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL18363110 0.84 CYP4F2 (0.55) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL5021627 0.84 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL2021436 0.84 CYP4F2 (0.67) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL824523 0.84 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1GAATHRB
SCHEMBL2607729 0.83 GAA (0.43) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16784765 0.83 ALDH1A1 (0.52) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL13296226 0.82 CYP4F2 (0.39) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL1628655 0.82 CYP4F2 (0.44) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 959 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115785819-A Silicon wafer polishing composition and application thereof 万华化学集团电子材料有限公司 2023-03-14 CN claimed
CN-114478238-A Method for continuously extracting and purifying sorbic acid hydrolysate 南通醋酸化工股份有限公司 2022-05-13 CN claimed
EP-2693896-B1 FRUITY FLAVORED COCOA PRODUCTS AND PROCESSES FOR PRODUCING SUCH COCOA PRODUCTS OLAM INTERNATIONAL LTD (SG) 2018-09-12 EP claimed
US-20260110920-A1 MATERIALS AND METHODS FOR LIGHT ADJUSTABLE OPHTHALMIC DEVICES JOHNSON & JOHNSON SURGICAL VISION INC (US) 2026-04-23 US disclosed
US-20260109796-A1 MATERIALS AND METHODS FOR LIGHT ADJUSTABLE OPHTHALMIC DEVICES JOHNSON & JOHNSON SURGICAL VISION INC (US) 2026-04-23 US disclosed
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-20240219829-A1 HYDROPHOBIC CROSSLINKABLE PINNING UNDERLAYERS WITH IMPROVED DRY ETCH CAPABILITIES FOR PATTERNING DIRECTED SELF-ASSEMBLY OF PS-B-PMMA TYPE BLOCK COPOLYMERS MERCK PATENT GMBH (DE) 2024-07-04 US disclosed
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
US-20240224723-A1 LIGHT EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME LG DISPLAY CO., LTD. (KR) 2024-07-04 US disclosed
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
US-20240208200-A1 ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING PRINTING PLATE FUJIFILM CORPORATION (JP) 2024-06-27 US disclosed
US-20070012573-A1 Lithographic printing plate support, method of manufacturing the same, and presensitized plate FUJI PHOTO FILM CO., LTD. 2007-01-18 US disclosed
CN-1266171-C Method for high pressure polymerization of ethylene BASELL POLYOLEFINE GMBH (DE) 2006-07-26 CN disclosed
WO-2006018718-A2 TRIAZOLOPYRIDINYLSULFANYL DERIVATIVES AS P38 MAP KINASE INHIBITORS PFIZER LIMITED (GB) 2006-02-23 WO disclosed
US-20060035922-A1 Triazolopyridinylsulfanyl derivatives as p38 MAP kinase inhibitors PFIZER INC. 2006-02-16 US disclosed
CN-1571802-A High pressure polymerization of ethylene BASELL POLYOLEFINE GMBH (DE) 2005-01-26 CN disclosed
US-5034504-A Spirodilactam polyamide polymer SHELL OIL COMPANY (US) 1991-07-23 US disclosed
US-4968770-A Polyamide from spirodilactam precursor and primary diamine SHELL OIL COMPANY (US) 1990-11-06 US disclosed
US-4908458-A 1,5-Di(benzoheterocyclic)-3-oxopentane derivatives SHELL OIL COMPANY (US) 1990-03-13 US disclosed
EP-0353448-A1 Sulfon amides, process for their preparation and pharmaceutical preparations containing them Roche Diagnostics GmbH (DE) 1990-02-07 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060035922-A1 Triazolopyridinylsulfanyl derivatives as p38 MAP kinase inhibitors MAPK1, MAPKAPK5, MAPKAPK3 CYP4F2 3368/4885CYP4A11 825/4885ALDH1A1 2400/4885
US-20260110920-A1 MATERIALS AND METHODS FOR LIGHT ADJUSTABLE OPHTHALMIC DEVICES ERCC1, ERCC5, ERCC4 CYP4F2 1469/4885CYP4A11 2369/4885ALDH1A1 3021/4885
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SCO2, CBR1, OXGR1 CYP4F2 890/4885CYP4A11 783/4885ALDH1A1 492/4885
US-20260109796-A1 MATERIALS AND METHODS FOR LIGHT ADJUSTABLE OPHTHALMIC DEVICES ERCC1, PDE6H, HCK CYP4F2 1409/4885CYP4A11 2109/4885ALDH1A1 2416/4885
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-0, HCN3, RER1 CYP4F2 767/4885CYP4A11 495/4885ALDH1A1 1499/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.