Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | ACACB | O00763 | 2/20 | 0.43 |
| ▸ | MAPT | P10636 | 4/20 | 0.42 |
| ▸ | LMNA | P02545 | 3/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | GSK3B | P49841 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | RORC | P51449 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8898680 | 0.92 | MAPT (0.47) | MAPTLMNASMN1; SMN2L3MBTL1NPC1 | |
| SCHEMBL1630676 | 0.90 | ALDH1A1 (0.51) | TSHRACACBMAPTLMNASMN1; SMN2 | |
| SCHEMBL1629303 | 0.89 | MAPT (0.53) | MAPTLMNASMN1; SMN2L3MBTL1NPC1 | |
| SCHEMBL1631619 | 0.88 | MAPT (0.44) | MAPTLMNASMN1; SMN2L3MBTL1NPC1 | |
| SCHEMBL58161 | 0.88 | NPC1 (0.48) | MAPTLMNASMN1; SMN2L3MBTL1NPC1 | |
| SCHEMBL20097748 | 0.88 | MAPT (0.48) | TSHRMAPTLMNASMN1; SMN2L3MBTL1 | |
| SCHEMBL16561591 | 0.88 | MAPT (0.45) | MAPTLMNASMN1; SMN2L3MBTL1NPC1 | |
| SCHEMBL17269413 | 0.88 | MAPT (0.44) | MAPTLMNASMN1; SMN2L3MBTL1NPC1 | |
| SCHEMBL18905115 | 0.87 | MAPT (0.43) | MAPTLMNASMN1; SMN2L3MBTL1NPC1 | |
| SCHEMBL1629230 | 0.87 | GSK3B (0.44) | MAPTLMNASMN1; SMN2L3MBTL1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1410109-B1 | PHOTOSENSITIVE RESIN COMPOSITION | BASF SE (DE) | 2011-10-26 | — | — | EP | claimed |
| US-7556843-B2 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2009-07-07 | — | — | US | claimed |
| US-7425585-B2 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2008-09-16 | — | — | US | claimed |
| US-20070259278-A1 | Photosensitive resin composition | IGM GROUP B.V. (NL) | 2007-11-08 | — | — | US | claimed |
| US-20070249748-A1 | Photosensitive resin composition | IGM GROUP B.V. (NL) | 2007-10-25 | — | — | US | claimed |
| US-7247659-B2 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2007-07-24 | — | — | US | claimed |
| US-20040192804-A1 | Photosensitive resin composition | IGM GROUP B.V. (NL) | 2004-09-30 | — | — | US | claimed |
| EP-1410109-A1 | PHOTOSENSITIVE RESIN COMPOSITION | Ciba SC Holding AG (CH) | 2004-04-21 | — | — | EP | claimed |
| WO-2003010602-A1 | PHOTOSENSITIVE RESIN COMPOSITION | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2003-02-06 | — | — | WO | claimed |
| CN-117471850-A | Photosensitive composition, method for producing patterned cured product, and black matrix | 东京应化工业株式会社 | 2024-01-30 | — | — | CN | disclosed |
| CN-115933312-A | Colored photosensitive composition, cured product, and image display device | 日本化药株式会社 | 2023-04-07 | — | — | CN | disclosed |
| CN-112650027-A | Method for producing substrate for organic EL panel, and negative photosensitive resin composition | 东京应化工业株式会社 | 2021-04-13 | — | — | CN | disclosed |
| CN-112147841-A | Photosensitive composition, cured product, black matrix, black bank, color filter, image display device, and method for producing patterned cured film | 东京应化工业株式会社 | 2020-12-29 | — | — | CN | disclosed |
| CN-105467755-B | Photosensitive resin composition | 东京应化工业株式会社 | 2020-11-13 | — | — | CN | disclosed |
| US-5629356-A | PHOTOCURABLE COMPOSITION CONTAINING ETHYLENICALLY UNSATURATED PHOTOPOLYMERIZABLE COMPOUND AND THE AMINOACETOPHENONE | CIBA GEIGY CORPORATION (US) | 1997-05-13 | — | — | US | disclosed |
| US-5554663-A | α-aminoacetophenones as photoinitiators | CIBA-GEIGY CORPORATION (US) | 1996-09-10 | — | — | US | disclosed |
| US-5534629-A | PHOTOPOLYMERIZATION OF PIGMENTED SYSTEMS, INKS | CIBA-GEIGY CORPORATION (US) | 1996-07-09 | — | — | US | disclosed |
| EP-0284561-B1 | ALPHA-AMINOACETOPHENONES AS PHOTO INITIATORS | CIBA-GEIGY AG (CH) | 1993-05-12 | — | — | EP | disclosed |
| US-5077402-A | For photocuring pigmented systems; printing inks, lacquers | CIBA-GEIGY CORPORATION (US) | 1991-12-31 | — | — | US | disclosed |
| EP-0284561-A2 | Alpha-aminoacetophenones as photo initiators | CIBA-GEIGY AG (CH) | 1988-09-28 | — | — | EP | disclosed |