SCHEMBL1629317

SCHEMBL1629317

C=CC(=O)N(CCc1ccccc1)CCc1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.56
NPC1 O15118 2/20 0.56
RAB9A P51151 2/20 0.56
MEN1 O00255 1/20 0.56
KMT2A Q03164 1/20 0.56
ALOX5 P09917 3/20 0.49
HDAC3 O15379 2/20 0.46
HDAC4 P56524 2/20 0.46
HDAC1 Q13547 2/20 0.46
HDAC7 Q8WUI4 2/20 0.46
HDAC2 Q92769 2/20 0.46
HDAC10 Q969S8 2/20 0.46
HDAC11 Q96DB2 2/20 0.46
HDAC8 Q9BY41 2/20 0.46
HDAC6 Q9UBN7 2/20 0.46
HDAC9 Q9UKV0 2/20 0.46
HDAC5 Q9UQL6 2/20 0.46
MAPK1 P28482 1/20 0.46
ADRA1A P35348 1/20 0.46
SLC6A3 Q01959 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22454599 0.90 TDP1 (0.50) TDP1NPC1RAB9AMEN1KMT2A
SCHEMBL29210015 0.87 KCNH2 (0.52) MEN1KMT2A
SCHEMBL16847369 0.85 MEN1 (0.47) TDP1NPC1RAB9AMEN1KMT2A
SCHEMBL29023315 0.84 CHRM2 (0.47) MEN1KMT2AALOX5ADRA1ASLC6A3
SCHEMBL295841 0.82 LMNA (0.53) TDP1NPC1RAB9AMEN1KMT2A
SCHEMBL10713197 0.82 MEN1 (0.43) TDP1NPC1RAB9AMEN1KMT2A
SCHEMBL10796032 0.82 TAAR1 (0.50) TDP1NPC1RAB9AMEN1KMT2A
SCHEMBL29173216 0.82 TRPM8 (0.46) TDP1NPC1RAB9AMEN1KMT2A
SCHEMBL1373021 0.81 MEN1 (0.53) TDP1MEN1KMT2AMAPTLMNA
SCHEMBL17183708 0.81 KCNH2 (0.54) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US claimed
EP-2960314-B1 POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE FUJIMI INC (JP) 2024-06-26 EP disclosed
EP-3159915-B1 METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET FUJIMI INC (JP) 2023-12-06 EP disclosed
EP-3133638-B1 COMPOSITION FOR POLISHING SILICON WAFERS FUJIMI INC (JP) 2021-10-27 EP disclosed
EP-2957613-B1 POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE FUJIMI INC (JP) 2020-11-18 EP disclosed
US-10745588-B2 Silicon wafer polishing composition FUJIMI INCORPORATED (JP) 2020-08-18 US disclosed
EP-3007213-B1 USE OF A COMPOSITION FOR SILICON WAFER POLISHING FUJIMI INC (JP) 2020-03-18 EP disclosed
EP-3605588-A1 POLISHING COMPOSITION Fujimi Incorporated (JP) 2020-02-05 EP disclosed
EP-3133639-B1 COMPOSITION FOR POLISHING SILICON WAFERS FUJIMI INC (JP) 2019-06-26 EP disclosed
US-20170253767-A1 SILICON WAFER POLISHING COMPOSITION FUJIMI INCORPORATED (JP) 2017-09-07 US disclosed
EP-2960314-A1 POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE Fujimi Incorporated (JP) 2015-12-30 EP disclosed
EP-2957613-A1 POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE Fujimi Incorporated (JP) 2015-12-23 EP disclosed
US-20110089114-A1 PROCESS FOR ABSORBING AND ADSORBING OIL DEGRADATION PRODUCTS FROM LUBRICATING OILS LIVINGSTONE GREGORY J 2011-04-21 US disclosed
US-7700540-B2 Hard surface cleaning composition THE CLOROX COMPANY (US) 2010-04-20 US disclosed
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US disclosed
US-6878789-B2 Preparation process of acrylic acid ester polymer KURARAY CO., LTD. (JP) 2005-04-12 US disclosed
EP-0945470-B1 Preparation process of acrylic acid ester polymer KURARAY CO (JP) 2004-10-13 EP disclosed
US-20020032290-A1 Preparation process of acrylic acid ester polymer KURARAY CO., LTD. (JP) 2002-03-14 US disclosed
US-6329480-B1 POLYMERIZING ACRYLIC ACID ESTER, ACRYLIC/METHACRYLIC MONOMER PRESENCE OF AN ORGANOLITHIUM COMPOUND AND AN ORGANOALUMINUM COMPOUND TO FORM BLOCK COPOLYMER KURARAY CO., LTD. (JP) 2001-12-11 US disclosed
EP-0945470-A1 Preparation process of acrylic acid ester polymer KURARAY CO., LTD. (JP) 1999-09-29 EP disclosed