⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19348583 | 0.79 | — | — | |
| SCHEMBL11786387 | 0.77 | TSHR (0.33) | — | |
| Phosphoric Acid SCHEMBL5167421 | 0.74 | TSHR (0.37) | — | |
| SCHEMBL14462983 | 0.72 | RAB9A (0.32) | — | |
| SCHEMBL3034781 | 0.72 | — | — | |
| SCHEMBL10405700 | 0.72 | — | — | |
| SCHEMBL12824230 | 0.72 | — | — | |
| Phosphoric Acid SCHEMBL3015655 | 0.70 | SMN1; SMN2 (0.34) | — | |
| Methyl Phosphonate SCHEMBL28215606 | 0.70 | CA2 (0.42) | — | |
| SCHEMBL1744749 | 0.69 | TSHR (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 181 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115537272-A | Monocrystalline silicon sample wafer cleaning agent and cleaning method | 新疆晶科能源有限公司 | 2022-12-30 | — | — | CN | claimed |
| CN-112322910-A | Method for removing antimony from new nickel electrodeposition liquid | 金川集团股份有限公司 | 2021-02-05 | — | — | CN | claimed |
| CN-111978623-A | Preparation method of winding film and winding film prepared by preparation method | 成都友一包装材料有限公司 | 2020-11-24 | — | — | CN | claimed |
| EP-1110992-B1 | Solid polymer electrolyte having high-durability | TOYOTA CHUO KENKYUSHO KK (JP) | 2006-08-02 | — | — | EP | claimed |
| EP-1263918-B1 | COMPOSITION SUITABLE FOR REMOVING PROTEINACEOUS MATERIAL | ECOLAB INC (US) | 2005-11-09 | — | — | EP | claimed |
| US-6607856-B2 | Solid polymer electrolyte having high-durability | KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO (JP) | 2003-08-19 | — | — | US | claimed |
| EP-1263918-A2 | COMPOSITION SUITABLE FOR REMOVING PROTEINACEOUS MATERIAL | ECOLAB INC. (US) | 2002-12-11 | — | — | EP | claimed |
| US-20010038937-A1 | Solid polymer electrolyte having high-durability | KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO (JP) | 2001-11-08 | — | — | US | claimed |
| WO-2001070921-A2 | COMPOSITION SUITABLE FOR REMOVING PROTEINACEOUS MATERIAL | ECOLAB INC. (US) | 2001-09-27 | — | — | WO | claimed |
| EP-1110992-A1 | Solid polymer electrolyte having high-durability | Kabushiki Kaisha Toyota Chuo Kenkyusho (JP) | 2001-06-27 | — | — | EP | claimed |
| US-6218349-B1 | FOR CLEANING AND SANITIZING IN FOOD PROCESS INDUSTRY | ECOLAB, INC. | 2001-04-17 | — | — | US | claimed |
| US-4430369-A | ALUMINOSILICATE FIBERS, CERAMICS, MATS, ALKALI STABILIZATION, AMINE-PHOSPHONIC OR ALIPHATIC ACID CONDENSATION PRODUCT | NALCO CHEMICAL COMPANY (US) | 1984-02-07 | — | — | US | claimed |
| JP-6073394-A | — | — | None | — | — | JP | disclosed |
| CN-118161520-A | Lipolytic composition using surface-modified gas-generating nanoparticles | 超新星生物有限公司 | 2024-06-11 | — | — | CN | disclosed |
| WO-2024090355-A1 | AQUEOUS POLYMER EMULSION FOR COSMETIC, PRODUCTION METHOD THEREFOR, AND COSMETIC | 東亞合成株式会社 | 2024-05-02 | — | — | WO | disclosed |
| WO-2024090354-A1 | AQUEOUS POLYMER EMULSION FOR COSMETIC, METHOD FOR PRODUCING SAME, AND COSMETIC | 東亞合成株式会社 | 2024-05-02 | — | — | WO | disclosed |
| US-5137937-A | An alkyl diamine phosphate | ALBRIGHT & WILSON AMERICAS INC. (US) | 1992-08-11 | — | — | US | disclosed |
| US-4830837-A | Process for removing aluminum from concentrated alkali metal halide brines | OLIN CORPORATION (US) | 1989-05-16 | — | — | US | disclosed |
| US-4314919-A | QUATERNARY AMMONIUM CATIONIC SURFACTANT | ENGELHARD MINERALS & CHEMICALS CORPORATION (US) | 1982-02-09 | — | — | US | disclosed |
| JP-H00673394-A | — | — | 0001-01-01 | — | — | JP | disclosed |