SCHEMBL16300513

SCHEMBL16300513

CC(C)(C)C(=O)Oc1ccc(C(=O)Oc2ccccc2)cc1

nearest known ligand 0.73

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ELANE P08246 13/20 0.73
MAPT P10636 3/20 0.63
TDP1 Q9NUW8 1/20 0.63
L3MBTL1 Q9Y468 1/20 0.63
PARP10 Q53GL7 1/20 0.57
PRTN3 P24158 1/20 0.55
KMT2A Q03164 3/20 0.54
ALDH1A1 P00352 1/20 0.54
PKM P14618 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.53
MEN1 O00255 1/20 0.51
RAB9A P51151 1/20 0.51
PRSS1 P07477 1/20 0.51
ACR P10323 1/20 0.51
TMPRSS15 P98073 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2342588 0.87 ELANE (0.72) ELANETDP1L3MBTL1PRTN3
SCHEMBL6721082 0.87 MAPT (0.59) ELANEMAPTTDP1L3MBTL1PARP10
SCHEMBL10932821 0.85 LMNA (0.61) ELANEMAPTTDP1L3MBTL1PRTN3
SCHEMBL6721014 0.85 MAPT (0.58) ELANEMAPTTDP1L3MBTL1PARP10
Ammonia Solution, Strong SCHEMBL11257764 0.85 ELANE (0.70) ELANETDP1L3MBTL1PRTN3
SCHEMBL28169662 0.85 ELANE (0.70) ELANETDP1L3MBTL1PRTN3
SCHEMBL28197586 0.85 ELANE (0.70) ELANETDP1L3MBTL1PRTN3
SCHEMBL10483704 0.84 ELANE (1.00) ELANE
SCHEMBL825366 0.84 MAPT (0.56) ELANEMAPTTDP1L3MBTL1PARP10
SCHEMBL8205435 0.83 PARP10 (0.78) ELANEMAPTTDP1L3MBTL1PARP10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed