SCHEMBL16355302

SCHEMBL16355302

COc1ccc(C(=O)c2ccc(Oc3ccc(C(C)(C)c4cccc(C(C)(C)c5ccc(OC)cc5)c4)cc3)cc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.48
GAA P10253 1/20 0.48
MAPT P10636 3/20 0.47
LMNA P02545 2/20 0.47
MAPK1 P28482 2/20 0.47
RAB9A P51151 2/20 0.47
KMT2A Q03164 2/20 0.47
MEN1 O00255 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47
RXFP1 Q9HBX9 1/20 0.47
PARP10 Q53GL7 1/20 0.47
HPGD P15428 1/20 0.47
TUBB4A P04350 1/20 0.47
TUBB P07437 1/20 0.47
TUBA3C P0DPH7 1/20 0.47
TUBA1B P68363 1/20 0.47
TUBA4A P68366 1/20 0.47
TUBB4B P68371 1/20 0.47
TUBB3 Q13509 1/20 0.47
TUBB2A Q13885 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14030863 0.95 MMP13 (0.49) ALDH1A1GAAMAPTLMNAMAPK1
SCHEMBL2628122 0.94 HPGD (0.60) ALDH1A1GAAMAPTLMNAMAPK1
SCHEMBL19380455 0.91 SRD5A2 (0.54) ALDH1A1GAAMAPTLMNAMAPK1
SCHEMBL19008824 0.91 MAPT (0.56) ALDH1A1GAAMAPTLMNAMAPK1
SCHEMBL12152071 0.91 MAPT (0.56) ALDH1A1GAAMAPTLMNAMAPK1
SCHEMBL12978434 0.91 MAPT (0.56) ALDH1A1GAAMAPTLMNAMAPK1
SCHEMBL15760406 0.89 MMP13 (0.49) ALDH1A1LMNARAB9AESR1ESR2
SCHEMBL15760405 0.89 MMP13 (0.49) ALDH1A1LMNARAB9AESR1ESR2
SCHEMBL2628161 0.87 ELANE (0.51) MAPTLMNAMAPK1RAB9AKMT2A
SCHEMBL14354267 0.87 MAPT (0.49) ALDH1A1GAAMAPTMAPK1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160311979-A1 COMPOSITION FOR FORMING PASSIVATION FILM, INCLUDING RESIN HAVING CARBON-CARBON MULTIPLE BOND NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-10-27 US disclosed
US-20140374887-A1 COMPOSITION FOR FORMING PASSIVATION FILM, INCLUDING RESIN HAVING CARBON-CARBON MULTIPLE BOND NISSAN CHEMICAL IMDUSTRIES, LTD. (JP) 2014-12-25 US disclosed