Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 3/20 | 0.48 |
| ▸ | BCAT2 | O15382 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.42 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | CERT1 | Q9Y5P4 | 3/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL21772120 | 1.00 | HPGD (0.50) | HPGDLMNABCAT2KDM4EL3MBTL1 | |
| SCHEMBL27947393 | 0.86 | HPGD (0.45) | HPGDLMNABCAT2KDM4EL3MBTL1 | |
| Phenylpropanol SCHEMBL28582184 | 0.85 | LMNA (0.70) | HPGDLMNABCAT2KDM4EL3MBTL1 | |
| Bicarbonate SCHEMBL2836236 | 0.84 | LMNA (0.54) | LMNABCAT2KDM4EL3MBTL1NPC1 | |
| Methacrylic Acid SCHEMBL23062661 | 0.82 | HPGD (0.47) | HPGDLMNAKDM4EAOC3GAA | |
| SCHEMBL24750 | 0.82 | LMNA (0.61) | LMNABCAT2KDM4EL3MBTL1NPC1 | |
| SCHEMBL30957022 | 0.82 | LMNA (0.61) | LMNABCAT2KDM4EL3MBTL1NPC1 | |
| SCHEMBL3413766 | 0.82 | LMNA (0.61) | LMNABCAT2KDM4EL3MBTL1NPC1 | |
| SCHEMBL1947849 | 0.82 | LMNA (0.61) | LMNABCAT2KDM4EL3MBTL1NPC1 | |
| SCHEMBL8366350 | 0.82 | LMNA (0.61) | LMNABCAT2KDM4EL3MBTL1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1783548-B1 | Method of forming a patterned layer on a substrate | ROHM & HAAS ELECT MAT (US) | 2017-03-08 | — | — | EP | disclosed |
| EP-1353228-B1 | Method for forming a relief image using a very thick photoresist layer on a semiconductor wafer and metal plating method | ROHM & HAAS ELECT MAT (US) | 2015-01-28 | — | — | EP | disclosed |
| US-8455175-B2 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-06-04 | — | — | US | disclosed |
| US-8263316-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-09-11 | — | — | US | disclosed |
| US-20110262861-A1 | PHOTOSENSITIVE COMPOSITION | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-10-27 | — | — | US | disclosed |
| EP-1632281-B1 | Process for absorbing hydrophobic substances in polymers having an hollow structure | ROHM & HAAS (US) | 2011-09-14 | — | — | EP | disclosed |
| US-7932016-B2 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-04-26 | — | — | US | disclosed |
| US-7723850-B2 | Electronic devices having air gaps | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-05-25 | — | — | US | disclosed |
| EP-1510318-B1 | Process for manufacturing polymers | ROHM & HAAS (US) | 2009-07-01 | — | — | EP | disclosed |
| US-7344970-B2 | Plating method | SHIPLEY COMPANY, L.L.C. (US) | 2008-03-18 | — | — | US | disclosed |
| EP-1092421-A2 | Method for preparing ultraviolet radiation absorbing compositions | ROHM AND HAAS COMPANY (US) | 2001-04-18 | — | — | EP | disclosed |
| US-5563011-A | WITH TOPCOATING CONTAINING COPOLYMERIC ACRYLIC BINDER, PHOTOACTIVE COMPOUND WHICH GENERATES AN ACID OR BASE WHEN EXPOSED TO ACTIVATING RADIATION AND CROSSLINKING AGENT | SHIPLEY COMPANY INC. (US) | 1996-10-08 | — | — | US | disclosed |
| CN-1132359-A | Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol | IBM (US) | 1996-10-02 | — | — | CN | disclosed |
| EP-0490118-A1 | Photoimagable solder mask and photosensitive composition | SHIPLEY COMPANY INC. (US) | 1992-06-17 | — | — | EP | disclosed |
| US-4877818-A | PHOTORESISTS | ROHM AND HAAS COMPANY (US) | 1989-10-31 | — | — | US | disclosed |
| US-4592816-A | Forming negative images on conductive surfaces | ROHM AND HAAS COMPANY (US) | 1986-06-03 | — | — | US | disclosed |
| EP-0176356-A2 | Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of same in forming films on substrates | ROHM AND HAAS COMPANY (US) | 1986-04-02 | — | — | EP | disclosed |
| US-4414278-A | NONAGGLOMERATING, NONSWELLING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-11-08 | — | — | US | disclosed |
| US-4308338-A | PRODUCTION OF WEAR-RESISTANT PRINTING PLATES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-29 | — | — | US | disclosed |
| US-4264708-A | COMPRISING AN EPOXY RESIN OR UNSATURATED DIESTER POLYHYDROXYPOLYETHER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-04-28 | — | — | US | disclosed |