Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.38 |
| ▸ | HPGD | P15428 | 4/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | ELANE | P08246 | 1/20 | 0.34 |
| ▸ | CTSG | P08311 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27840990 | 0.84 | TSHR (0.56) | TSHRHPGDALDH1A1HSD17B10MAPK1 | |
| Acrylic Acid Ethyl Ester SCHEMBL29619669 | 0.84 | HPGD (0.37) | TSHRHPGDKMT2AALDH1A1HSD17B10 | |
| SCHEMBL4366251 | 0.81 | TSHR (0.46) | TSHR | |
| Acrylic Acid Ethyl Ester SCHEMBL4368399 | 0.79 | USP2 (0.36) | TSHRHPGDALDH1A1HSD17B10MAPK1 | |
| Acrylic Acid Ethyl Ester SCHEMBL28084864 | 0.79 | TSHR (0.46) | TSHRHPGDKMT2AALDH1A1HSD17B10 | |
| Acrylic Acid SCHEMBL21879967 | 0.77 | LMNA (0.40) | LMNAPOLBKDM4EMAPT | |
| Acrylic Acid Ethyl Ester SCHEMBL28085458 | 0.76 | TSHR (0.54) | TSHRHPGDLMNAALDH1A1HSD17B10 | |
| Acrylic Acid SCHEMBL4366247 | 0.76 | LMNA (0.36) | LMNAPOLBKDM4EMAPT | |
| Acrylic Acid Ethyl Ester SCHEMBL4449784 | 0.76 | TSHR (0.43) | TSHRHPGDKMT2APOLBALDH1A1 | |
| Acrylic Acid Ethyl Ester SCHEMBL8159679 | 0.74 | TSHR (0.60) | TSHRHPGDLMNAALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1865035-B1 | INK COMPOSITION FOR INKJET PRINTER | DAINIPPON INK & CHEMICALS (JP) | 2013-05-01 | — | — | EP | claimed |
| US-8383743-B2 | Ink composition for jet printer | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2013-02-26 | — | — | US | claimed |
| US-20090130405-A1 | INK COMPOSITION FOR JET PRINTER | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2009-05-21 | — | — | US | claimed |
| EP-1865035-B1 | INK COMPOSITION FOR INKJET PRINTER | DAINIPPON INK & CHEMICALS (JP) | 2013-05-01 | — | — | EP | disclosed |
| US-8383743-B2 | Ink composition for jet printer | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2013-02-26 | — | — | US | disclosed |
| US-7932340-B2 | Comprises self cleavage type radical-generating part and at least one unsaturated group in one molecule; suppresses volatilization of low molecular weight decomposition materials during radiation and post-baking, leaving no decomposition residues in final product; for use in printing inks, color filters | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20090130405-A1 | INK COMPOSITION FOR JET PRINTER | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2009-05-21 | — | — | US | disclosed |
| US-7528205-B2 | Photo radical generator, photo sensitive resin composition and article | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-05-05 | — | — | US | disclosed |
| EP-1865035-A1 | INK COMPOSITION FOR INKJET PRINTER | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2007-12-12 | — | — | EP | disclosed |
| US-20070037096-A1 | Comprises self cleavage type radical-generating part and at least one unsaturated group in one molecule; suppresses volatilization of low molecular weight decomposition materials during radiation and post-baking, leaving no decomposition residues in final product; for use in printing inks, color filters | DAI NIPPON PRINTING CO. LTD. | 2007-02-15 | — | — | US | disclosed |
| US-7141354-B2 | Photo radical generator, photo sensitive resin composition and article | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-11-28 | — | — | US | disclosed |
| US-20050119433-A1 | Photo radical generator, photo sensitive resin composition and article | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-06-02 | — | — | US | disclosed |
| US-20050119432-A1 | Photo radical generator, photo sensitive resin composition and article | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-06-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050119432-A1 | Photo radical generator, photo sensitive resin composition and article | RRS1, HEATR1, PSMC6 | TSHR 3331/4885HPGD 451/4885LMNA 3548/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.