Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 2/20 | 0.34 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL676864 | 0.86 | KDM4E (0.41) | HTR2ASIGMAR1KDM4EGAAMAPT | |
| Hydrochloric Acid SCHEMBL5746772 | 0.84 | MAPT (0.40) | HTR2ASIGMAR1KDM4EGAAMAPT | |
| SCHEMBL5747124 | 0.81 | CYP3A4 (0.40) | HTR2ASIGMAR1KDM4EGAAMAPT | |
| SCHEMBL5745827 | 0.79 | KDM4E (0.39) | HTR2ASIGMAR1KDM4EGAAMAPT | |
| SCHEMBL13967904 | 0.74 | KDM4E (0.32) | SIGMAR1KDM4EGAAMAPT | |
| SCHEMBL13967928 | 0.74 | KDM4E (0.32) | SIGMAR1KDM4EGAAMAPT | |
| SCHEMBL13967926 | 0.73 | KDM4E (0.34) | SIGMAR1KDM4EGAAMAPT | |
| SCHEMBL13967975 | 0.73 | SIGMAR1 (0.45) | SIGMAR1 | |
| SCHEMBL13967982 | 0.72 | KDM4E (0.33) | SIGMAR1KDM4EGAAMAPT | |
| SCHEMBL13169288 | 0.72 | SIGMAR1 (0.32) | SIGMAR1KDM4EGAAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11059995-B2 | Film forming composition | MERCK PATENT GMBH (DE) | 2021-07-13 | — | — | US | disclosed |
| US-20200377761-A1 | FILM FORMING COMPOSITION | MERCK PATENT GMBH (DE) | 2020-12-03 | — | — | US | disclosed |
| US-9323153-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | FUJIFILM CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-9323153-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | FUJIFILM CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-20150004533-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| US-20150004533-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |