SCHEMBL1637673

SCHEMBL1637673

CC=CC(=O)OCCOCCOC(=O)C=CC

nearest known ligand 0.54

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.54
ALDH1A1 P00352 3/20 0.54
TP53 P04637 2/20 0.54
HIF1A Q16665 2/20 0.54
HSD17B10 Q99714 1/20 0.54
ATM Q13315 1/20 0.46
HCAR2 Q8TDS4 6/20 0.43
THRB P10828 1/20 0.40
GSTP1 P09211 1/20 0.39
MAPT P10636 1/20 0.35
RAB9A P51151 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30849896 1.00 TSHR (0.54) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL27716011 0.93 ATM (0.52) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL8673805 0.93 ATM (0.52) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL21636771 0.93 ATM (0.52) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL8734426 0.92 TSHR (0.47) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL13241272 0.92 ALDH1A1 (0.52) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL28865015 0.92 TSHR (0.47) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL11107400 0.92 TSHR (0.47) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL10547653 0.92 ALDH1A1 (0.52) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL19292019 0.92 ALDH1A1 (0.52) TSHRALDH1A1TP53HIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115698095-B Photosensitive composition, cured product thereof, organic electroluminescent display device, and method for producing photosensitive composition 电化株式会社 2024-04-02 CN disclosed
CN-117430731-A Photosensitive composition, cured product thereof, organic electroluminescent display device, and method for producing photosensitive composition 电化株式会社 2024-01-23 CN disclosed
WO-2023182283-A1 SEALING AGENT AND SEALING MATERIAL FOR ORGANIC ELECTROLUMINESCENT ELEMENTS, ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE, AND METHOD FOR PRODUCING SEALING AGENT FOR ORGANIC ELECTROLUMINESCENT ELEMENTS デンカ株式会社 2023-09-28 WO disclosed
WO-2023182281-A1 ENCAPSULANT FOR ORGANIC ELECTROLUMINESCENT ELEMENT, ENCAPSULATION MATERIAL, AND ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE デンカ株式会社 2023-09-28 WO disclosed
US-20230303922-A1 FLUORESCENT MATERIAL SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20230250332-A1 FLUORESCENT MATERIAL SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-10 US disclosed
CN-115698095-A Photosensitive composition, cured product thereof, organic electroluminescent display device, and method for producing photosensitive composition 电化株式会社 2023-02-03 CN disclosed
CN-115298226-A Photosensitive composition, cured product, organic electroluminescent display device, and method for producing photosensitive composition 电化株式会社 2022-11-04 CN disclosed
US-20210380820-A1 CURABLE COMPOSITION, FILM, LAMINATED BODY, AND DISPLAY APPARATUS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-09 US disclosed
EP-3875493-A1 CURABLE RESIN COMPOSITION, FILM, LAMINATE AND DISPLAY DEVICE Sumitomo Chemical Company, Limited (JP) 2021-09-08 EP disclosed
US-20040018724-A1 Plating method SHIPLEY COMPANY, L.L.C (US) 2004-01-29 US disclosed
EP-1353228-A1 Method for depositing a very thick photoresist layer on a substrate and metal plating method Shipley Co. L.L.C. (US) 2003-10-15 EP disclosed
US-6384104-B1 PROVIDING STORAGE STABILITY TO ULTRAVIOLET RADIATION ABSORPTION COMPOSITIONS BY ADDING LATEX POLYMER PARTICLES TO INCREASE ABSORPTION, WHEREIN PARTICLES CONTAIN VOID, HAVE SPECIFIED PARTICLE SIZE AND COMPRISE CROSSLINKED SHELL PORTION ROHM AND HAAS COMPANY 2002-05-07 US disclosed
EP-1092421-A2 Method for preparing ultraviolet radiation absorbing compositions ROHM AND HAAS COMPANY (US) 2001-04-18 EP disclosed
US-5563011-A WITH TOPCOATING CONTAINING COPOLYMERIC ACRYLIC BINDER, PHOTOACTIVE COMPOUND WHICH GENERATES AN ACID OR BASE WHEN EXPOSED TO ACTIVATING RADIATION AND CROSSLINKING AGENT SHIPLEY COMPANY INC. (US) 1996-10-08 US disclosed
EP-0490118-A1 Photoimagable solder mask and photosensitive composition SHIPLEY COMPANY INC. (US) 1992-06-17 EP disclosed
US-4877818-A PHOTORESISTS ROHM AND HAAS COMPANY (US) 1989-10-31 US disclosed
EP-0176356-B1 PHOTOSENSITIVE POLYMER COMPOSITIONS, ELECTROPHORETIC DEPOSITION PROCESSES USING SAME, AND THE USE OF SAME IN FORMING FILMS ON SUBSTRATES ROHM AND HAAS COMPANY (US) 1988-11-02 EP disclosed
US-4592816-A Forming negative images on conductive surfaces ROHM AND HAAS COMPANY (US) 1986-06-03 US disclosed
EP-0176356-A2 Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of same in forming films on substrates ROHM AND HAAS COMPANY (US) 1986-04-02 EP disclosed