Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | ATM | Q13315 | 2/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.36 |
| ▸ | ANPEP | P15144 | 1/20 | 0.35 |
| ▸ | ERAP2 | Q6P179 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.33 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.33 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.33 |
| ▸ | DRD3 | P35462 | 1/20 | 0.33 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11162976 | 0.91 | MEN1 (0.37) | MEN1KMT2AMAPTATML3MBTL1 | |
| SCHEMBL2680331 | 0.87 | MEN1 (0.37) | MEN1KMT2AMAPTATML3MBTL1 | |
| SCHEMBL11152882 | 0.85 | MEN1 (0.32) | MEN1KMT2AMAPTATMPOLB | |
| SCHEMBL7904700 | 0.82 | L3MBTL1 (0.40) | MEN1KMT2AMAPTL3MBTL1ALDH1A1 | |
| SCHEMBL11268764 | 0.78 | SMN1; SMN2 (0.47) | POLBCHRM3SIGMAR1PKM | |
| SCHEMBL12283058 | 0.78 | USP2 (0.48) | MEN1KMT2AMAPTL3MBTL1ANPEP | |
| SCHEMBL4876041 | 0.77 | L3MBTL1 (0.42) | MEN1KMT2AMAPTATML3MBTL1 | |
| SCHEMBL18051907 | 0.76 | MEN1 (0.48) | MEN1KMT2AMAPTATMANPEP | |
| SCHEMBL16340365 | 0.76 | ANPEP (0.38) | MEN1KMT2AMAPTATML3MBTL1 | |
| SCHEMBL6920752 | 0.75 | HRH3 (0.46) | MEN1KMT2AMAPTL3MBTL1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250243320-A1 | SULFONATE GROUP-BASED ANION RESIN, PREPARATION METHOD THEREOF, AND ANION EXCHANGE MEMBRANE | EVE Hydrogen Energy Co., LTD. (CN) | 2025-07-31 | — | — | US | disclosed |
| US-20250243309-A1 | NITROGEN-CONTAINING COMPOUNDS AND PREPARATION METHOD THEREOF, ANIONIC RESIN, AND ANIONIC EXCHANGE MEMBRANE | EVE Hydrogen Energy Co., LTD. (CN) | 2025-07-31 | — | — | US | disclosed |
| EP-4591978-A1 | SULFONATE GROUP-BASED ANION RESIN, PREPARATION METHOD THEREOF, AND ANION EXCHANGE MEMBRANE | EVE Hydrogen Energy Co., LTD. (CN) | 2025-07-30 | — | — | EP | disclosed |
| EP-4592330-A1 | NITROGEN-CONTAINING COMPOUNDS AND PREPARATION METHOD THEREOF, ANIONIC RESIN, AND ANIONIC EXCHANGE MEMBRANE | EVE Hydrogen Energy Co., LTD. (CN) | 2025-07-30 | — | — | EP | disclosed |
| WO-2024235507-A1 | METHOD FOR PRODUCING A POLYMER, IN PARTICULAR FOR A MEMBRANE, POLYMER, MEMBRANE AND USE OF A MEMBRANE | Forschungszentrum Jülich GmbH (DE) | 2024-11-21 | — | — | WO | disclosed |
| WO-2024160834-A1 | METHOD FOR PRODUCING A POLYMER, IN PARTICULAR FOR A MEMBRANE, POLYMER, MEMBRANE AND USE OF A MEMBRANE | Forschungszentrum Jülich GmbH (DE) | 2024-08-08 | — | — | WO | disclosed |
| CN-118027359-A | Nitrogen-containing compound, preparation method thereof, anion resin and anion exchange membrane | 惠州亿纬氢能有限公司 | 2024-05-14 | — | — | CN | disclosed |
| CN-117924628-A | Method for producing sulfonic anion resin, and anion exchange membrane | 惠州亿纬氢能有限公司 | 2024-04-26 | — | — | CN | disclosed |
| US-8536242-B2 | Photocurable composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20110097669-A1 | PHOTOCURABLE COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2011-04-28 | — | — | US | disclosed |
| EP-1544202-A1 | NOVEL HERBICIDES, USAGE THEREOF, NOVEL THIENOPYRIMIDINE DERIVATIVES, INTERMEDIATES OF THE SAME, AND PROCESS FOR PRODUCTION THEREOF | Nihon Nohyaku Co., Ltd. (JP) | 2005-06-22 | — | — | EP | disclosed |
| US-6727294-B2 | RADIATION TRANSPARENT MOLDING MATERIALS | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20010034419-A1 | Radiation transparent molding materials | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2001-10-25 | — | — | US | disclosed |
| US-6106999-A | SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS | MITSUI CHEMICALS (JP) | 2000-08-22 | — | — | US | disclosed |
| US-6100008-A | POSITIVE ACTING PHOTORESIST COMPRISES ATLEAST ONE POSITIVE ACTING PHOTOACTIVE POLYMERIC COMPOUND CONTAINING 2,6 OR 2,5 DINITRO SUBSTITUTED BENZENE COMPOUND AND A DIMETHYL ANILINE COMPOUND | PPG INDUSTRIES OHIO, INC. (US) | 2000-08-08 | — | — | US | disclosed |
| US-5395895-A | Ethylene-maleic anhydride copolymer with polyhydric alcohol and catalysts | SHOWA DENKO K.K. (JP) | 1995-03-07 | — | — | US | disclosed |
| EP-0565734-A1 | RESIN COMPOSITION AND MOLDING PRODUCED THEREFROM | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1993-10-20 | — | — | EP | disclosed |
| US-4940645-A | Imaging material employing photosensitive microcapsules containing tertiary amines as coinitiators | THE MEAD CORPORATION (US) | 1990-07-10 | — | — | US | disclosed |
| US-4788126-A | Radiation dosimeter and method for measuring radiation dosage | THE MEAD CORPORATION (US) | 1988-11-29 | — | — | US | disclosed |
| US-4713312-A | Imaging system employing photosensitive microcapsules containing 3-substituted coumarins and other photobleachable sensitizers | THE MEAD CORPORATION (US) | 1987-12-15 | — | — | US | disclosed |