SCHEMBL1638817

SCHEMBL1638817

CCCCCC([Si](C)(OC)OC)[Si](C)(OC)OC

nearest known ligand 0.37

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.37
FDPS P14324 4/20 0.37
ZDHHC7 Q9NXF8 1/20 0.35
LMNA P02545 2/20 0.34
DNM1 Q05193 2/20 0.33
SMPD1 P17405 3/20 0.32
TSHR P16473 1/20 0.32
THRB P10828 1/20 0.32
GPR84 Q9NQS5 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6711930 0.98 FDPS (0.39) OPRM1FDPSZDHHC7LMNADNM1
SCHEMBL558283 0.98 FDPS (0.39) OPRM1FDPSZDHHC7LMNADNM1
SCHEMBL6711889 0.98 FDPS (0.39) OPRM1FDPSZDHHC7LMNADNM1
SCHEMBL6708507 0.98 FDPS (0.39) OPRM1FDPSZDHHC7LMNADNM1
SCHEMBL1639204 0.98 FDPS (0.39) OPRM1FDPSZDHHC7LMNADNM1
SCHEMBL1639193 0.93 DNM1 (0.35) FDPSDNM1TSHR
SCHEMBL1638921 0.82
SCHEMBL5315359 0.82 CA1 (0.31) FDPSDNM1
SCHEMBL1821988 0.81 ZDHHC7 (0.39) OPRM1FDPSZDHHC7LMNADNM1
SCHEMBL22551499 0.80 ZDHHC7 (0.31) FDPSZDHHC7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022215510-A1 CURABLE ORGANOPOLYSILOXANE COMPOSITION, THERMALLY CONDUCTIVE MEMBER, AND HEAT DISSIPATION STRUCTURE ダウ・東レ株式会社 2022-10-13 WO disclosed
EP-1391476-B1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO LTD (JP) 2015-12-09 EP disclosed
US-9181356-B2 Hydrogenation catalyst composition and hydrogenation method thereof TSRC CORPORATION (TW) 2015-11-10 US disclosed
US-8852737-B2 Coating composition and photochromic optical article TOKUYAMA CORPORATION (JP) 2014-10-07 US disclosed
EP-2768885-A1 MULTI-COMPONENT ROOM-TEMPERATURE-CURABLE SILICONE ELASTOMER COMPOSITION Dow Corning Toray Co., Ltd. (JP) 2014-08-27 EP disclosed
EP-2316862-B1 Hydrogenation catalyst composition and hydrogenation method thereof TSRC CORP (TW) 2013-12-25 EP disclosed
US-8557377-B2 Photochromic optical element TOKUYAMA CORPORATION (JP) 2013-10-15 US disclosed
US-8536242-B2 Photocurable composition SEKISUI CHEMICAL CO., LTD. (JP) 2013-09-17 US disclosed
WO-2013058293-A1 MULTI-COMPONENT ROOM-TEMPERATURE-CURABLE SILICONE ELASTOMER COMPOSITION DOW CORNING TORAY CO., LTD. (JP) 2013-04-25 WO disclosed
US-20110105694-A1 HYDROGENATION CATALYST COMPOSITION AND HYDROGENATION METHOD THEREOF TSRC CORPORATION (TW) 2011-05-05 US disclosed
US-20100110521-A1 COATING COMPOSITION AND PHOTOCHROMIC OPTICAL ARTICLE TOKUYAMA CORPORATION 2010-05-06 US disclosed
EP-2113542-A1 COATING COMPOSITION AND PHOTOCHROMIC OPTICAL ARTICLE TOKUYAMA CORPORATION (JP) 2009-11-04 EP disclosed
US-20090206034-A1 MODIFIED SILICA GEL AND USE THEREOF DAISO CO., LTD. (JP) 2009-08-20 US disclosed
EP-1978382-A1 PHOTOCHROMIC OPTICAL ELEMENT Tokuyama Corporation (JP) 2008-10-08 EP disclosed
US-7312013-B2 Photoreactive composition SEKISUI CHEMICAL CO., LTD. (JP) 2007-12-25 US disclosed
US-20040202956-A1 a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films SEKISUI CHEMICAL CO., LTD. (JP) 2004-10-14 US disclosed
EP-1391476-A1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 2004-02-25 EP disclosed
US-20040028978-A1 Proton conducting membrane, method for producing the same, and fuel cell using the same NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2004-02-12 US disclosed
EP-1334993-A2 Proton conducting membrane, method for producing the same, and fuel cell using the same National Institute of Advanced Industrial Science and Technology (JP) 2003-08-13 EP disclosed
US-6372398-B1 PREPARING A SILICON-CONTAINING COATING AGENT CONTAINING HYDROLYTIC SILICON COMPOUNDS AND A HYDROLYTIC SILICON COMPOUND HAVING REACTIVE GROUP WHICH HAS BEEN EXCHANGED WITH SUBSTITUENT OF PROTECTIVE GROUP PRECURSOR; COATING AND CURING FUJI XEROX CO., LTD. (JP) 2002-04-16 US disclosed