⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5246792 | 0.92 | — | — | |
| SCHEMBL15429245 | 0.89 | — | — | |
| SCHEMBL14183061 | 0.87 | — | — | |
| SCHEMBL18767117 | 0.86 | — | — | |
| SCHEMBL14194889 | 0.85 | — | — | |
| SCHEMBL628831 | 0.84 | — | — | |
| SCHEMBL1638789 | 0.83 | — | — | |
| SCHEMBL15678739 | 0.81 | — | — | |
| SCHEMBL863089 | 0.81 | — | — | |
| SCHEMBL7740414 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12610790-B2 | Structure including a photoresist underlayer and method of forming same | ASM IP HOLDING B.V. (NL) | 2026-04-21 | — | — | US | claimed |
| CN-117886325-A | Preparation method of silicon carbide aerogel | 安徽中科恒安安全科技有限公司 | 2024-04-16 | — | — | CN | claimed |
| CN-110648961-B | Semiconductor structure and forming method thereof | 台湾积体电路制造股份有限公司 | 2023-05-23 | — | — | CN | claimed |
| US-20210013037-A1 | STRUCTURE INCLUDING A PHOTORESIST UNDERLAYER AND METHOD OF FORMING SAME | ASM IP HOLDING B.V. (NL) | 2021-01-14 | — | — | US | claimed |
| CN-110648961-A | Semiconductor structure and forming method thereof | 台湾积体电路制造股份有限公司 | 2020-01-03 | — | — | CN | claimed |
| US-9896326-B2 | FCVD line bending resolution by deposition modulation | APPLIED MATERIALS, INC. (US) | 2018-02-20 | — | — | US | claimed |
| US-20160181089-A1 | FCVD LINE BENDING RESOLUTION BY DEPOSITION MODULATION | APPLIED MATERIALS, INC. (US) | 2016-06-23 | — | — | US | claimed |
| US-20160017487-A1 | INTEGRATED PRE-CLEAN AND DEPOSITION OF LOW-DAMAGE LAYERS | APPLIED MATERIALS, INC. | 2016-01-21 | — | — | US | claimed |
| US-20150167160-A1 | ENABLING RADICAL-BASED DEPOSITION OF DIELECTRIC FILMS | APPLIED MATERIALS, INC. | 2015-06-18 | — | — | US | claimed |
| JP-2008523165-A | — | — | 2008-07-03 | — | — | JP | claimed |
| EP-1833880-A1 | ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS | Matsushita Electric Works, Ltd. (JP) | 2007-09-19 | — | — | EP | claimed |
| WO-2006062219-A1 | ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS | MATSUSHITA ELECTRIC WORKS, LTD. (JP) | 2006-06-15 | — | — | WO | claimed |
| US-20050221622-A1 | Deposition method and semiconductor device | SEMICONDUCTOR PROCESS LABORATORY CO., LTD. (JP) | 2005-10-06 | — | — | US | claimed |
| EP-0698632-B1 | Process for preparing organosiloxane terminated with silanol group | SHINETSU CHEMICAL CO (JP) | 2001-11-21 | — | — | EP | claimed |
| US-5576408-A | Process for preparing low molecular weight organosiloxane terminated with silanol group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-11-19 | — | — | US | claimed |
| US-12610790-B2 | Structure including a photoresist underlayer and method of forming same | ASM IP HOLDING B.V. (NL) | 2026-04-21 | — | — | US | disclosed |
| US-20260018411-A1 | REMOTE ICP RADICAL DEPOSITION OF TUNABLE LOW-K DIELECTRIC FILMS | APPLIED MATERIALS INC (US) | 2026-01-15 | — | — | US | disclosed |
| EP-0698632-A1 | Process for preparing organosiloxane terminated with silanol group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-02-28 | — | — | EP | disclosed |
| EP-0560617-A2 | Method of manufacturing insulating film on semiconductor device and apparatus for carrying out the same | KAWASAKI STEEL CORPORATION (JP) | 1993-09-15 | — | — | EP | disclosed |
| EP-0520752-A1 | Stabilised polymer composition and use | Borealis Holding A/S (DK) | 1992-12-30 | — | — | EP | disclosed |