⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10015830 | 0.97 | — | — | |
| SCHEMBL1221739 | 0.94 | — | — | |
| SCHEMBL26121730 | 0.88 | — | — | |
| SCHEMBL5462781 | 0.87 | — | — | |
| SCHEMBL862832 | 0.85 | — | — | |
| SCHEMBL5458463 | 0.83 | — | — | |
| SCHEMBL1393765 | 0.83 | — | — | |
| SCHEMBL1092235 | 0.83 | — | — | |
| SCHEMBL4943786 | 0.83 | — | — | |
| SCHEMBL4948167 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20050221622-A1 | Deposition method and semiconductor device | SEMICONDUCTOR PROCESS LABORATORY CO., LTD. (JP) | 2005-10-06 | — | — | US | claimed |
| EP-1391476-B1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO LTD (JP) | 2015-12-09 | — | — | EP | disclosed |
| US-8536242-B2 | Photocurable composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20110097669-A1 | PHOTOCURABLE COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2011-04-28 | — | — | US | disclosed |
| US-7312013-B2 | Photoreactive composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20050221622-A1 | Deposition method and semiconductor device | SEMICONDUCTOR PROCESS LABORATORY CO., LTD. (JP) | 2005-10-06 | — | — | US | disclosed |
| US-20040202956-A1 | a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-10-14 | — | — | US | disclosed |
| EP-1391476-A1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-02-25 | — | — | EP | disclosed |