⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5465996 | 0.96 | — | — | |
| SCHEMBL26121730 | 0.90 | — | — | |
| SCHEMBL679184 | 0.90 | — | — | |
| SCHEMBL1221739 | 0.89 | — | — | |
| SCHEMBL12387145 | 0.87 | — | — | |
| SCHEMBL19497424 | 0.87 | — | — | |
| SCHEMBL1700006 | 0.87 | — | — | |
| SCHEMBL1700048 | 0.87 | — | — | |
| SCHEMBL12387175 | 0.87 | — | — | |
| SCHEMBL1700008 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250215210-A1 | DIENE RUBBER COMPOSITION AND METHOD FOR PRODUCING SAME | ETIC INC. (JP) | 2025-07-03 | — | — | US | disclosed |
| EP-4502015-A1 | DIENE RUBBER COMPOSITION AND METHOD FOR PRODUCING SAME | Etic Inc. (JP) | 2025-02-05 | — | — | EP | disclosed |
| US-20250011628-A1 | RELEASE COMPOSITION, ARTICLES PREPARED FROM THE RELEASE COMPOSITION, AND RELATED METHODS | 3M INNOVATIVE PROPERTIES COMPANY | 2025-01-09 | — | — | US | disclosed |
| EP-4433525-A1 | RELEASE COMPOSITION, ARTICLES PREPARED FROM THE RELEASE COMPOSITION, AND RELATED METHODS | 3M Innovative Properties Company (US) | 2024-09-25 | — | — | EP | disclosed |
| CN-118302476-A | Stripping composition, articles made from stripping composition, and related methods | 3M创新有限公司 | 2024-07-05 | — | — | CN | disclosed |
| WO-2023190934-A1 | DIENE RUBBER COMPOSITION AND METHOD FOR PRODUCING SAME | 有限会社ETIC | 2023-10-05 | — | — | WO | disclosed |
| US-20230183483-A1 | THERMALLY CONDUCTIVE SILICONE COMPOSITION, PRODUCTION METHOD FOR SAME, AND SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-20230167347-A1 | THERMAL CONDUCTIVE SILICONE COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-01 | — | — | US | disclosed |
| WO-2023091407-A1 | RELEASE COMPOSITION, ARTICLES PREPARED FROM THE RELEASE COMPOSITION, AND RELATED METHODS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2023-05-25 | — | — | WO | disclosed |
| US-9074101-B2 | Siloxane-grafted silica, transparent silicone composition, and optoelectronic device encapsulated therewith | NIIGATA UNIVERSITY (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20090121180-A1 | SILOXANE-GRAFTED SILICA, TRANSPARENT SILICONE COMPOSITION, AND OPTOELECTRONIC DEVICE ENCAPSULATED THEREWITH | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-14 | — | — | US | disclosed |
| US-20080075895-A1 | Optical Laminated Film for Liquid Crystal Display Device | MATSUSHITA ELECTRIC WORKS, LTD. (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20070178319-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO, LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| EP-1564269-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-17 | — | — | EP | disclosed |
| US-20040216641-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |