Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1641548 | 0.88 | LMNA (0.33) | LMNAHPGDHIF1AHSD17B10 | |
| SCHEMBL1642145 | 0.85 | TYR (0.33) | — | |
| SCHEMBL1642565 | 0.83 | MEN1 (0.36) | LMNAHPGD | |
| SCHEMBL1640839 | 0.83 | MEN1 (0.36) | LMNAHPGD | |
| SCHEMBL1641020 | 0.81 | BRD4 (0.38) | — | |
| SCHEMBL2880464 | 0.78 | GRIN2D (0.36) | — | |
| SCHEMBL1642787 | 0.77 | HSD17B10 (0.39) | LMNAHSD17B10 | |
| SCHEMBL1642967 | 0.74 | CA12 (0.30) | — | |
| SCHEMBL1641649 | 0.74 | CA12 (0.31) | — | |
| SCHEMBL13135756 | 0.73 | BRD4 (0.40) | LMNAHPGDHIF1AHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1728256-B1 | CROSSLINKED SELF-DOPING TYPE ELECTRICALLY CONDUCTING POLYMER, PRODUCTION PROCESS THEREOF, PRODUCT COATED WITH THE POLYMER AND ELECTRONIC DEVICE | SHOWA DENKO KK (JP) | 2015-05-13 | — | — | EP | disclosed |
| US-9023247-B2 | Antistatic treatment agent, and antistatic film, coated article and pattern forming method using the agent | SHOWA DENKO K.K. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8821761-B2 | Antistatic agent, antistatic film and articles coated with antistatic film | SHOWA DENKO K.K. (JP) | 2014-09-02 | — | — | US | disclosed |
| EP-1807477-B1 | ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT | SHOWA DENKO KK (JP) | 2013-08-07 | — | — | EP | disclosed |
| US-8178281-B2 | Method for improving sensitivity of resist | SHOWA DENKO K.K. (JP) | 2012-05-15 | — | — | US | disclosed |
| US-20110143283-A1 | METHOD FOR IMPROVING SENSITIVITY OF RESIST | SHOWA DENKO K.K. (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20110097671-A1 | ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT | SHOWA DENKO K.K. (JP) | 2011-04-28 | — | — | US | disclosed |
| US-7887906-B2 | a water-soluble electroconductive polymer containing polythiophenes, polypyrroles, polyanilines, polyfurans with SO3M group and a biosurfactant having a hydrophilic site, produced from a bacteria; excellent in property of preventing film-thinning in chemically amplified resist, and an antistatic film | SHOWA DENKO K.K. (JP) | 2011-02-15 | — | — | US | disclosed |
| US-7857999-B2 | Crosslinked self-doping type electrically conducting polymer, production process thereof, product coated with the polymer and electronic device | SHOWA DENKO K.K. (JP) | 2010-12-28 | — | — | US | disclosed |
| EP-1702372-B1 | POLYMER FOR ANODE BUFFER LAYER, COATING SOLUTION FOR ANODE BUFFER LAYER, AND ORGANIC LIGHT EMITTING DEVICE | SHOWA DENKO KK (JP) | 2010-09-01 | — | — | EP | disclosed |
| US-20070231604-A1 | Electroconductive Composition and Application Thereof | SHOWA DENKO K.K. (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070194285-A1 | Crosslinked Self-Doping Type Electrically Conducting Polymer, Production Process Thereof, Product Coated With The Polymer And Electronic Device | SHOWA DENKO K.K. (JP) | 2007-08-23 | — | — | US | disclosed |
| EP-1818369-A2 | Antistatic agent, antistatic film and articles coated with antistatic film | Showa Denko Kabushiki Kaisha (JP) | 2007-08-15 | — | — | EP | disclosed |
| US-20070181857-A1 | Antistatic agent, antistatic film and articles coated with antistatic film | SHOWA DENKO K.K. | 2007-08-09 | — | — | US | disclosed |
| US-20070173575-A1 | Polymer for anode buffer layer, coating solution for anode buffer layer, and organic light emitting device | SHOWA DENKO K.K. (JP) | 2007-07-26 | — | — | US | disclosed |
| WO-2007001076-A1 | SOLID ELECTROLYTIC CAPACITOR AND PRODUCTION METHOD THEREOF | SHOWA DENKO K.K. (JP) | 2007-01-04 | — | — | WO | disclosed |
| EP-1728256-A1 | CROSSLINKED SELF-DOPING TYPE ELECTRICALLY CONDUCTING POLYMER, PRODUCTION PROCESS THEREOF, PRODUCT COATED WITH THE POLYMER AND ELECTRONIC DEVICE | Showa Denko K.K. (JP) | 2006-12-06 | — | — | EP | disclosed |
| EP-1702372-A1 | POLYMER FOR ANODE BUFFER LAYER, COATING SOLUTION FOR ANODE BUFFER LAYER, AND ORGANIC LIGHT EMITTING DEVICE | Showa Denko K.K. (JP) | 2006-09-20 | — | — | EP | disclosed |
| WO-2005091309-A1 | CROSSLINKED SELF-DOPING TYPE ELECTRICALLY CONDUCTING POLYMER, PRODUCTION PROCESS THEREOF, PRODUCT COATED WITH THE POLYMER AND ELECTRONIC DEVICE | SHOWA DENKO K.K. (JP) | 2005-09-29 | — | — | WO | disclosed |
| WO-2005057677-A1 | POLYMER FOR ANODE BUFFER LAYER, COATING SOLUTION FOR ANODE BUFFER LAYER, AND ORGANIC LIGHT EMITTING DEVICE | SHOWA DENKO K.K (JP) | 2005-06-23 | — | — | WO | disclosed |