SCHEMBL1642145

SCHEMBL1642145

CCCCc1cc2[c]s[c]c2cc1S(=O)(=O)O

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TYR P14679 1/20 0.33
ELANE P08246 1/20 0.30
CTSG P08311 1/20 0.30
GABRP O00591 1/20 0.30
GABRD O14764 1/20 0.30
GABRA1 P14867 1/20 0.30
GABRB1 P18505 1/20 0.30
GABRG2 P18507 1/20 0.30
GABRB3 P28472 1/20 0.30
GABRA5 P31644 1/20 0.30
GABRA3 P34903 1/20 0.30
GABRA2 P47869 1/20 0.30
GABRB2 P47870 1/20 0.30
GABRA4 P48169 1/20 0.30
GABRE P78334 1/20 0.30
GABRA6 Q16445 1/20 0.30
GABRG1 Q8N1C3 1/20 0.30
GABRG3 Q99928 1/20 0.30
GABRQ Q9UN88 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1642565 0.94 MEN1 (0.36) TYRELANECTSGCA2
SCHEMBL1640839 0.94 MEN1 (0.36) TYRELANECTSGCA2
SCHEMBL1641548 0.91 LMNA (0.33)
SCHEMBL1642274 0.85 LMNA (0.33)
SCHEMBL4193773 0.77 GPR35 (0.35) CA2
SCHEMBL1641020 0.75 BRD4 (0.38)
SCHEMBL5499940 0.74 KDM4E (0.33) TYRELANECTSGGABRPGABRD
SCHEMBL2879945 0.73 TYR (0.33) TYRELANECTSGGABRPGABRD
SCHEMBL25386393 0.70 TYR (0.54) TYR
SCHEMBL11806380 0.70 TYR (0.59) TYRELANECTSG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1728256-B1 CROSSLINKED SELF-DOPING TYPE ELECTRICALLY CONDUCTING POLYMER, PRODUCTION PROCESS THEREOF, PRODUCT COATED WITH THE POLYMER AND ELECTRONIC DEVICE SHOWA DENKO KK (JP) 2015-05-13 EP disclosed
US-9023247-B2 Antistatic treatment agent, and antistatic film, coated article and pattern forming method using the agent SHOWA DENKO K.K. (JP) 2015-05-05 US disclosed
US-8821761-B2 Antistatic agent, antistatic film and articles coated with antistatic film SHOWA DENKO K.K. (JP) 2014-09-02 US disclosed
EP-1807477-B1 ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT SHOWA DENKO KK (JP) 2013-08-07 EP disclosed
US-8178281-B2 Method for improving sensitivity of resist SHOWA DENKO K.K. (JP) 2012-05-15 US disclosed
US-20110143283-A1 METHOD FOR IMPROVING SENSITIVITY OF RESIST SHOWA DENKO K.K. (JP) 2011-06-16 US disclosed
US-20110097671-A1 ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT SHOWA DENKO K.K. (JP) 2011-04-28 US disclosed
US-7887906-B2 a water-soluble electroconductive polymer containing polythiophenes, polypyrroles, polyanilines, polyfurans with SO3M group and a biosurfactant having a hydrophilic site, produced from a bacteria; excellent in property of preventing film-thinning in chemically amplified resist, and an antistatic film SHOWA DENKO K.K. (JP) 2011-02-15 US disclosed
US-7857999-B2 Crosslinked self-doping type electrically conducting polymer, production process thereof, product coated with the polymer and electronic device SHOWA DENKO K.K. (JP) 2010-12-28 US disclosed
EP-1702372-B1 POLYMER FOR ANODE BUFFER LAYER, COATING SOLUTION FOR ANODE BUFFER LAYER, AND ORGANIC LIGHT EMITTING DEVICE SHOWA DENKO KK (JP) 2010-09-01 EP disclosed
EP-2019129-A2 Antistatic agent, antistatic film and articles coated with antistatic film Showa Denko K.K. (JP) 2009-01-28 EP disclosed
US-20080193730-A1 Antistatic Agent, Antistatic Film and Product Coated with Antistatic Film SHOWA DENKO K.K. (JP) 2008-08-14 US disclosed
US-20070252111-A1 Antistatic Treatment Agent, and Antistatic Film, Coated Article and Pattern Forming Method Using the Agents SHOWA DENKO K.K. (JP) 2007-11-01 US disclosed
US-20070231604-A1 Electroconductive Composition and Application Thereof SHOWA DENKO K.K. (JP) 2007-10-04 US disclosed
US-20070194285-A1 Crosslinked Self-Doping Type Electrically Conducting Polymer, Production Process Thereof, Product Coated With The Polymer And Electronic Device SHOWA DENKO K.K. (JP) 2007-08-23 US disclosed
EP-1818369-A2 Antistatic agent, antistatic film and articles coated with antistatic film Showa Denko Kabushiki Kaisha (JP) 2007-08-15 EP disclosed
US-20070181857-A1 Antistatic agent, antistatic film and articles coated with antistatic film SHOWA DENKO K.K. 2007-08-09 US disclosed
US-20070173575-A1 Polymer for anode buffer layer, coating solution for anode buffer layer, and organic light emitting device SHOWA DENKO K.K. (JP) 2007-07-26 US disclosed
EP-1702372-A1 POLYMER FOR ANODE BUFFER LAYER, COATING SOLUTION FOR ANODE BUFFER LAYER, AND ORGANIC LIGHT EMITTING DEVICE Showa Denko K.K. (JP) 2006-09-20 EP disclosed
WO-2005057677-A1 POLYMER FOR ANODE BUFFER LAYER, COATING SOLUTION FOR ANODE BUFFER LAYER, AND ORGANIC LIGHT EMITTING DEVICE SHOWA DENKO K.K (JP) 2005-06-23 WO disclosed