⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16435692 | 0.86 | — | — | |
| SCHEMBL16435695 | 0.83 | — | — | |
| SCHEMBL16435694 | 0.81 | — | — | |
| SCHEMBL14870405 | 0.79 | — | — | |
| SCHEMBL16372632 | 0.77 | — | — | |
| SCHEMBL16372723 | 0.77 | — | — | |
| SCHEMBL11948961 | 0.75 | HSD11B1 (0.35) | — | |
| SCHEMBL47517 | 0.70 | — | — | |
| SCHEMBL14870385 | 0.68 | — | — | |
| SCHEMBL15281162 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9395625-B2 | Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2016-07-19 | — | — | US | disclosed |
| US-20150037733-A1 | ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |