SCHEMBL1645477

SCHEMBL1645477

C[N+](C)(C)CCOS(=O)(=O)c1ccc(N)c2ccccc12

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ NSD2 O96028 8/20 0.39
▸ TTR P02766 1/20 0.37
▸ KEAP1 Q14145 1/20 0.36
▸ IDO1 P14902 1/20 0.36
▸ EP300 Q09472 1/20 0.35
▸ KAT8 Q9H7Z6 1/20 0.35
▸ CHRM2 P08172 2/20 0.33
▸ CHRM4 P08173 2/20 0.33
▸ CHRM1 P11229 2/20 0.33
▸ CHRM3 P20309 2/20 0.33
▸ SCN1A P35498 1/20 0.33
▸ SCN2A Q99250 1/20 0.33
▸ SCN3A Q9NY46 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1645476 0.78 CA2 (0.52) NSD2
SCHEMBL10643515 0.74 GAA (0.39) CHRM2CHRM4CHRM1CHRM3SCN1A
SCHEMBL9118978 0.73 SCN1A (0.46) CHRM2CHRM4CHRM1CHRM3SCN1A
SCHEMBL28843103 0.73 CHRM4 (0.43) CHRM2CHRM4CHRM1CHRM3SCN1A
SCHEMBL11528163 0.69 TTR (0.50) NSD2TTRIDO1EP300KAT8
SCHEMBL31603821 0.69 TTR (0.50) NSD2TTRIDO1EP300KAT8
SCHEMBL9177053 0.68 TTR (0.46) NSD2TTRIDO1EP300KAT8
SCHEMBL2093558 0.68 TTR (0.75) NSD2TTRIDO1EP300KAT8
SCHEMBL9649777 0.68 TTR (0.75) NSD2TTRIDO1EP300KAT8
SCHEMBL27898160 0.68 CDC25B (0.42) NSD2TTR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10907056-B2 Curable compositions BLUE CUBE IP LLC (US) 2021-02-02 — — US disclosed
EP-3271428-B1 CURABLE COMPOSITIONS BLUE CUBE IP LLC (US) 2020-11-11 — — EP disclosed
US-20180100076-A1 CURABLE COMPOSITIONS DOW GLOBAL TECHNOLOGIES LLC 2018-04-12 — — US disclosed
EP-3271428-A1 CURABLE COMPOSITIONS Blue Cube IP LLC (US) 2018-01-24 — — EP disclosed
WO-2016153894-A1 CURABLE COMPOSITIONS BLUE CUBE IP LLC (US) 2016-09-29 — — WO disclosed
US-8236199-B2 Phosphorescent/fluorescent compositions and methods UNIVERSITY OF GEORGIA RESEARCH FOUNDATION, INC. (US) 2012-08-07 — — US disclosed
US-20110122177-A1 Ink Jet Recording Apparatus KABUSHIKI KAISHA TOSHIBA (JP) 2011-05-26 — — US disclosed
US-7947466-B2 Fluorescence based screening assays are provided that allow for the for identification of agents that selectively bind to a ligand-gated ion channels (LGIC); fluorescence resonance energy transfer (FRET) HANSEN SCOTT B 2011-05-24 — — US disclosed
US-20110095232-A1 Phosphorescent/fluorescent compositions and methods UNIVERSITY OF GEORGIA RESEARCH FOUNDATION 2011-04-28 — — US disclosed
US-7896484-B2 Ink jet recording apparatus KABUSHIKI KAISHA TOSHIBA (JP) 2011-03-01 — — US disclosed
EP-1528089-A2 Pigment dispersion, precursor of ink for uv-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion Toshiba Tec Kabushiki Kaisha (JP) 2005-05-04 — — EP disclosed
US-20050090580-A1 Ink for ink jet recording KABUSHIKI KAISHA TOSHIBA 2005-04-28 — — US disclosed
US-20050090582-A1 Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion RISO TECHNOLOGIES CORPORATION (JP) 2005-04-28 — — US disclosed
US-20050057630-A1 Ink for ink jet and ink jet recording apparatus TOSHIBA TEC KABUSHIKI KAISHA (JP) 2005-03-17 — — US disclosed
EP-1514911-A1 Ink for ink jet and ink jet recording apparatus Toshiba Tec Kabushiki Kaisha (JP) 2005-03-16 — — EP disclosed
US-20030231234-A1 Liquid ink and recording apparatus TOSHIBA TEC KABUSHIKI KAISHA (JP) 2003-12-18 — — US disclosed
EP-1357159-A2 Liquid ink and recording apparatus Toshiba Tec Kabushiki Kaisha (JP) 2003-10-29 — — EP disclosed
CN-1282889-A Composition used for forming inorganic envelope and method to form inorganic envelope TOKYO APPLIED CHEMISTRY IND CO (JP) 2001-02-07 — — CN disclosed
US-6168897-B1 PATTERNWISE-EXPOSING THE LAMINATED LAYER COMPRISING LIGHT SENSITIVE LAYER AND FLUORESCENT LIGHT-GENERATING LAYER TO ELECTROMAGNETIC RADIATION AND AN ELECTRON BEAM TO GENERATE A FLUORESCENT LIGHT CAUSING PHOTOCHEMICAL REACTION, DEVELOPING KABUSHIKI KAISHA TOSHIBA (JP) 2001-01-02 — — US disclosed
US-5928841-A Method of photoetching at 180 to 220 KABUSHIKI KAISHA TOSHIBA (JP) 1999-07-27 — — US disclosed
Send feedback