SCHEMBL1646097

SCHEMBL1646097

C1CN=C(CCC2=NCCCO2)OC1

nearest known ligand 0.48

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
NOS3 P29474 2/20 0.48
NOS1 P29475 2/20 0.48
NOS2 P35228 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1648964 0.90 NOS3 (0.44) NOS3NOS1NOS2
SCHEMBL1648909 0.88 NOS3 (0.43) NOS3NOS1NOS2
SCHEMBL9319840 0.88 NOS3 (0.43) NOS3NOS1NOS2
SCHEMBL9579349 0.86
SCHEMBL1647712 0.84 NOS3 (0.48) NOS3NOS1NOS2
SCHEMBL351538 0.83 ADRA2A (0.34)
SCHEMBL9579280 0.83 NOS3 (0.39) NOS3NOS1NOS2
SCHEMBL29117665 0.81 NOS3 (0.38) NOS3NOS1NOS2
SCHEMBL9579247 0.81 NOS3 (0.38) NOS3NOS1NOS2
SCHEMBL25194435 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4169977-B1 RESIN COMPOSITION, MOLDED BODY AND ELECTROMAGNETIC WAVE ABSORBER MITSUBISHI CHEM CORP (JP) 2026-03-18 EP disclosed
US-12559623-B2 Resin composition and electromagnetic wave absorber MITSUBISHI CHEMICAL CORPORATION (JP) 2026-02-24 US disclosed
US-20250002701-A9 RESIN COMPOSITION, FORMED ARTICLE , ELECTROMAGNETIC WAVE ABSORBER, AND METHOD FOR MEASURING ABSORBANCE OF RESIN COMPOSITION MITSUBISHI CHEMICAL CORPORATION (JP) 2025-01-02 US disclosed
US-20230340252-A1 RESIN COMPOSITION AND ELECTROMAGNETIC WAVE ABSORBER MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2023-10-26 US disclosed
EP-4261250-A1 RESIN COMPOSITION, PELLET, MOLDED ARTICLE AND METHOD FOR PRODUCING RESIN COMPOSITION Mitsubishi Chemical Corporation (JP) 2023-10-18 EP disclosed
US-20230303826-A1 RESIN COMPOSITION, PELLET AND MOLDED ARTICLE, AND PROCESS FOR PRODUCING RESIN COMPOSITION MITSUBISHI CHEMICAL CORPORATION (JP) 2023-09-28 US disclosed
US-20230242747-A1 RESIN COMPOSITION, FORMED ARTICLE , ELECTROMAGNETIC WAVE ABSORBER, AND METHOD FOR MEASURING ABSORBANCE OF RESIN COMPOSITION MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2023-08-03 US disclosed
EP-4171188-A1 RESIN COMPOSITION AND ELECTROMAGNETIC WAVE ABSORBER Mitsubishi Engineering-Plastics Corporation (JP) 2023-04-26 EP disclosed
EP-4169977-A1 RESIN COMPOSITION, MOLDED BODY, ELECTROMAGNETIC WAVE ABSORBER, AND METHOD FOR MEASURING ABSORPTION RATE OF RESIN COMPOSITION Mitsubishi Engineering-Plastics Corporation (JP) 2023-04-26 EP disclosed
US-20220348762-A1 RESIN COMPOSITION, PELLET AND POWDER FOR USE IN POWDER ADDITIVE MANUFACTURING, METHOD FOR MANUFACTURING SHAPED ARTICLE, AND SHAPED ARTICLE MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2022-11-03 US disclosed
EP-0336391-B1 Reversibly color-changeable materials TEIJIN LTD (JP) 1994-01-26 EP disclosed
US-5252407-A Containing cyclic iminoether compound TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1993-10-12 US disclosed
US-5189094-A Reacting a poly(cyclic iminoether), and ethylenically unsaturated compounds TEIJIN LIMITED (JP) 1993-02-23 US disclosed
EP-0335980-B1 RUBBER COMPOSITE Takeda Chemical Industries, Ltd. (JP) 1993-01-27 EP disclosed
US-5068062-A Crosslinked resin containing 4,4*-diaminodiphenylmethane units with the amine quaternized and an electrolytic material TEIJIN LIMITED (JP) 1991-11-26 US disclosed
US-4931512-A REACTING POLY(CYCLIC IMINOETHER) WITH POLYOLS OR POLYAMINES, ACID CATALYST; CURABLE TEIJIN LIMITED (JP) 1990-06-05 US disclosed
EP-0335980-A1 RUBBER COMPOSITE Takeda Chemical Industries, Ltd. (JP) 1989-10-11 EP disclosed
EP-0336390-A2 Process for producing thermoset resin TEIJIN LIMITED (JP) 1989-10-11 EP disclosed
EP-0336391-A2 Reversibly color-changeable materials TEIJIN LIMITED (JP) 1989-10-11 EP disclosed
EP-0273368-A2 Process for producing thermoset resin TEIJIN LIMITED (JP) 1988-07-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12559623-B2 Resin composition and electromagnetic wave absorber TERB1, LBR, TEX10 NOS3 1846/4885NOS1 1667/4885NOS2 2459/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.