SCHEMBL16469656

SCHEMBL16469656

CC(C)(C=CC(=O)O)CC(C)(C)C=CC(=O)O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.40
TP53 P04637 1/20 0.40
EGLN1 Q9GZT9 1/20 0.40
EGLN3 Q9H6Z9 1/20 0.40
TBXAS1 P24557 1/20 0.39
GABRR1 P24046 2/20 0.35
GABRR2 P28476 2/20 0.35
BLM P54132 2/20 0.35
LMNA P02545 2/20 0.35
GABRR3 A8MPY1 1/20 0.35
APEX1 P27695 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
HCAR2 Q8TDS4 3/20 0.34
GABRP O00591 2/20 0.32
GABRD O14764 2/20 0.32
GABRA1 P14867 2/20 0.32
GABRB1 P18505 2/20 0.32
GABRG2 P18507 2/20 0.32
GABRB3 P28472 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16469655 1.00 TSHR (0.40) TSHRTP53EGLN1EGLN3TBXAS1
SCHEMBL3192910 0.84 TBXAS1 (0.46) TSHRTP53EGLN1EGLN3TBXAS1
SCHEMBL3192914 0.84 TBXAS1 (0.46) TSHRTP53EGLN1EGLN3TBXAS1
SCHEMBL4373237 0.82 TSHR (0.38) TSHRTP53EGLN1EGLN3TBXAS1
SCHEMBL32684399 0.80 TBXAS1 (0.37) TSHRTP53EGLN1EGLN3TBXAS1
SCHEMBL3204840 0.80 TBXAS1 (0.51) TSHRTP53EGLN1EGLN3TBXAS1
SCHEMBL28702595 0.80 HMGCR (0.44) TSHRTP53EGLN1EGLN3TBXAS1
SCHEMBL3200011 0.80 TBXAS1 (0.55) TSHRTP53EGLN1EGLN3TBXAS1
SCHEMBL22070965 0.80 HMGCR (0.44) TSHRTP53EGLN1EGLN3TBXAS1
SCHEMBL3204835 0.80 TBXAS1 (0.51) TSHRTP53EGLN1EGLN3TBXAS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9817311-B2 Resist pattern-forming method, substrate-processing method, and photoresist composition JSR CORPORATION (JP) 2017-11-14 US disclosed
US-20160266489-A1 RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHOTORESIST COMPOSITION JSR CORPORATION (JP) 2016-09-15 US disclosed
US-9417527-B2 Resist pattern-forming method, substrate-processing method, and photoresist composition JSR CORPORATION (JP) 2016-08-16 US disclosed
US-20150048051-A1 RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHOTORESIST COMPOSITION JSR CORPORATION (JP) 2015-02-19 US disclosed