Butadiene

Butadiene

SCHEMBL16538076

C=C(C(=O)O)C(C)(C)C.C=CC=C

nearest known ligand 0.33

Full drug profile on Sugi Atlas →

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 1/20 0.33
LMNA P02545 1/20 0.32
ALDH1A1 P00352 2/20 0.30
TSHR P16473 1/20 0.30
ALOX15 P16050 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23950 0.89
SCHEMBL2137763 0.89 TET2 (0.39) TET2ALDH1A1TSHR
Acrylic Acid SCHEMBL7053348 0.87 LMNA (0.50) TET2LMNAALDH1A1TSHRALOX15
Acrylamide SCHEMBL2104167 0.83 ALDH1A1 (0.50) TET2LMNAALDH1A1TSHRALOX15
Methacrylic Acid SCHEMBL7560025 0.81 TDP1 (0.36) TET2ALDH1A1TSHR
Propane SCHEMBL8856062 0.81 TET2 (0.39) TET2ALDH1A1TSHR
SCHEMBL8679625 0.78 PTGS1 (0.30) TET2
SCHEMBL3804196 0.78 PTGS1 (0.30) TET2
Pivalate SCHEMBL6482998 0.77 ALDH1A1 (0.44) TET2LMNAALDH1A1TSHR
Sulfuric Acid SCHEMBL5416918 0.77 TET2 (0.32) TET2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230173403-A1 SOLVENT VAPOR SUPPLY APPARATUS AND SOLVENT VAPOR SUPPLY METHOD TOKYO ELECTRON LIMITED (JP) 2023-06-08 US disclosed
US-10121659-B2 Pattern forming method and heating apparatus TOKYO ELECTRON LIMITED (JP) 2018-11-06 US disclosed
US-20180019118-A1 PATTERN FORMING METHOD AND HEATING APPARATUS TOKYO ELECTRON LTD (JP) 2018-01-18 US disclosed
US-9859118-B2 Pattern forming method and heating apparatus TOKYO ELECTRON LIMITED (JP) 2018-01-02 US disclosed
US-9618849-B2 Pattern forming method, pattern forming apparatus, and computer readable storage medium TOKYO ELECTRON LIMITED (JP) 2017-04-11 US disclosed
US-9530645-B2 Pattern forming method, pattern forming apparatus, and non-transitory computer-readable storage medium TOKYO ELECTRON LIMITED (JP) 2016-12-27 US disclosed
US-20160293403-A1 PATTERN FORMING METHOD AND HEATING APPARATUS TOKYO ELECTRON LIMITED (JP) 2016-10-06 US disclosed
US-20150072536-A1 PATTERN FORMING METHOD, PATTERN FORMING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM TOKYO ELECTRON LIMITED (JP) 2015-03-12 US disclosed
US-20150062545-A1 PATTERN FORMING METHOD, PATTERN FORMING APPARATUS, AND COMPUTER READABLE STORAGE MEDIUM TOKYO ELECTRON LIMITED (JP) 2015-03-05 US disclosed