Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN1A | P35498 | 1/20 | 0.35 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.35 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14316065 | 0.93 | SCN1A (0.34) | SCN1ASCN2ASCN3ACYP19A1 | |
| SCHEMBL18266770 | 0.83 | SCN1A (0.37) | SCN1ASCN2ASCN3ACYP19A1 | |
| SCHEMBL22319314 | 0.79 | SCN1A (0.35) | SCN1ASCN2ASCN3A | |
| SCHEMBL15962035 | 0.78 | SCN1A (0.42) | SCN1ASCN2ASCN3A | |
| SCHEMBL13564215 | 0.77 | HSD11B1 (0.39) | SCN1ASCN2ASCN3ACYP19A1 | |
| SCHEMBL2380571 | 0.77 | CYP19A1 (0.38) | SCN1ASCN2ASCN3ACYP19A1 | |
| SCHEMBL13554494 | 0.77 | SCN1A (0.33) | SCN1ASCN2ASCN3A | |
| SCHEMBL16575760 | 0.75 | — | — | |
| SCHEMBL15203384 | 0.75 | SCN1A (0.33) | SCN1ASCN2ASCN3ACYP19A1 | |
| SCHEMBL1105065 | 0.75 | HSD11B1 (0.40) | SCN1ASCN2ASCN3A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9235117-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-20150079508-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-19 | — | — | US | disclosed |